Effects of Hf contamination on the properties of silicon oxide metal–oxide–semiconductor devices
Keyword(s):
Boron Diffusion Through Pure Silicon Oxide and Oxynitride Used for Metal‐Oxide‐Semiconductor Devices
1993 ◽
Vol 140
(12)
◽
pp. 3624-3627
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Keyword(s):
2009 ◽
Vol 27
(3)
◽
pp. 1261
Keyword(s):
2011 ◽
Vol 32
(7)
◽
pp. 076001
◽
2010 ◽
Vol 242
◽
pp. 012010
◽
Keyword(s):