KSTAR edge probe diagnostics

2003 ◽  
Vol 74 (3) ◽  
pp. 1578-1582 ◽  
Author(s):  
J. G. Bak ◽  
S. G. Lee ◽  
Keyword(s):  
Probe Diagnostics ◽  
Edge Probe

Probe diagnostics of laboratory and ionospheric rarefied plasma flows

2013 ◽  
Vol 19 (1(80)) ◽  
pp. 13-19
Author(s):  
V.A. Shuvalov ◽  
◽  
A.A. Lukenjuk ◽  
N.I. Pismenny ◽  
S.N. Kulagin ◽  
...  
Keyword(s):  
Plasma Flows ◽  
Probe Diagnostics

SPECTROSCOPIC AND PROBE DIAGNOSTICS OF CARBON PLASMA FLOWS OF A PULSE VACUUM ARC

2010 ◽  
Vol 14 (1-2) ◽  
pp. 157-163 ◽  
Author(s):  
I. P. Smyaglikov ◽  
N. I. Chubrik ◽  
S.V. Goncharik ◽  
V. V. Azharonok ◽  
L. E. Krat'ko ◽  
...  
Keyword(s):  
Vacuum Arc ◽  
Plasma Flows ◽  
Probe Diagnostics ◽  
Carbon Plasma

Probe diagnostics of gas discharges in supersonic airflows

AIAA Journal ◽  
2001 ◽  
Vol 39 ◽  
pp. 2180-2187
Author(s):  
A. Ershov ◽  
N. Ardelyan ◽  
S. Chuvashev ◽  
V. Shibkov ◽  
I. Timofeev
Keyword(s):  
Gas Discharges ◽  
Probe Diagnostics

Hydrocarbon Ecr Reactive Ion Etching of III-V Semiconductors with Sims Plasma Probe Diagnostics

1993 ◽  
Vol 324 ◽  
Author(s):  
Douglas L. Melville ◽  
J.G. Simmons ◽  
D.A. Thompson
Keyword(s):  
Gas Flow ◽  
Reactive Ion Etching ◽  
Microwave Cavity ◽  
Multiple Quantum ◽  
Volatile Product ◽  
Reaction Products ◽  
Dominant Group ◽  
Ion Etching ◽  
Probe Diagnostics ◽  
Plasma Probe

AbstractThe advantages of in-situ SIMS plasma probe diagnostics are highlighted in low pressure hydrocarbon ECR reactive ion etching (RIE) of III-V materials. Three aspects of the RIE process are investigated. First, the dominant ion species in a CH4/H2/Ar plasma are recorded at various chamber pressures, ECR powers, CH4/(CH4+H2) gas flow ratios and microwave cavity tuning. These studies have improved our understanding of the effects of these parameters on the relative concentrations of reactive precursor species in the plasma and have led to more rapid optimization of the etch system. Secondly, SIMS has been used for identification of reaction products from the III-V surface at the optimized plasma conditions. The Ar diluted mixture gives rise to significant levels of group V hydrides and organometallic compounds and the dominant group III volatile ions have been positively identified as dimethyl species. The third and final aspect reported is the application of volatile product identification to endpoint detection. In lcm2 multiple quantum well samples, layers as thin as 50Å are easily distinguishable.

scholarly journals The upgraded heavy ion beam probe diagnostics on the T-10 tokamak

2016 ◽  
Vol 747 ◽  
pp. 012017 ◽  
Author(s):  
M A Drabinskii ◽  
P O Khabanov ◽  
A V Melnikov ◽  
L I Krupnik ◽  
A S Kozachek ◽  
...  
Keyword(s):  
Ion Beam ◽  
Heavy Ion ◽  
Probe Diagnostics ◽  
Heavy Ion Beam ◽  
Heavy Ion Beam Probe

The martian plasma environment: electric field and Langmuir probe diagnostics

2003 ◽  
Vol 31 (6) ◽  
pp. 1232-1236
Author(s):  
L.G. Blomberg ◽  
J.A. Cumnock ◽  
A.I. Eriksson
Keyword(s):  
Electric Field ◽  
Langmuir Probe ◽  
Plasma Environment ◽  
Probe Diagnostics

Bended probe diagnostics of the plasma characteristics within an ECR ion source with a rectangular waveguide

2018 ◽  
Vol 20 (8) ◽  
pp. 085402 ◽  
Author(s):  
Juan YANG ◽  
Yuliang FU ◽  
Xianchuang LIU ◽  
Haibo MENG ◽  
Yizhou JIN
Keyword(s):  
Rectangular Waveguide ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Probe Diagnostics ◽  
Plasma Characteristics
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