scholarly journals Polarized Raman scattering of epitaxial Pb(Zr,Ti)O3 thin films in the tetragonal-phase field

2002 ◽  
Vol 81 (13) ◽  
pp. 2439-2441 ◽  
Author(s):  
Sun-Hwa Lee ◽  
Hyun M. Jang ◽  
Hyun H. Sung ◽  
Hyunjung Yi
2004 ◽  
Vol 96 (9) ◽  
pp. 5110-5116 ◽  
Author(s):  
Hyunjung Yi ◽  
Min G. Kim ◽  
Jung H. Park ◽  
Hyun M. Jang

2009 ◽  
Vol 30 (8) ◽  
pp. 083001 ◽  
Author(s):  
Liang Ting ◽  
Li Junhong ◽  
Du Wenlong ◽  
Xue Chenyang ◽  
Zhang Wendong

Nanoscale ◽  
2016 ◽  
Vol 8 (14) ◽  
pp. 7672-7682 ◽  
Author(s):  
R. Srikantharajah ◽  
K. Gerstner ◽  
S. Romeis ◽  
W. Peukert

2015 ◽  
Vol 05 (02) ◽  
pp. 1550013 ◽  
Author(s):  
J. Pokorný ◽  
I. Rafalovskyi ◽  
I. Gregora ◽  
F. Borodavka ◽  
M. Savinov ◽  
...  

This paper describes a detailed analysis of the dependence of Raman scattering intensity on the polarization of the incident and inelastically scattered light in PbSc 0.5 Nb 0.5 O 3 (PSN) single crystals and epitaxially compressed thin films grown on (100)-oriented MgO substrates. It is found that there are significant differences between the properties of the crystals and films, and that these differences can be attributed to the anticipated structural differences between these two forms of the same material. In particular, the scattering characteristics of the oxygen octahedra breathing mode near 810 cm-1 indicate a ferroelectric state for the crystals and a relaxor state for the films, which is consistent with the dielectric behaviors of these materials.


1992 ◽  
Vol 7 (11) ◽  
pp. 3065-3071 ◽  
Author(s):  
Peir-Yung Chu ◽  
Isabelle Campion ◽  
Relva C. Buchanan

Phase transformation and preferred orientation in ZrO2 thin films, deposited on Si(111) and Si(100) substrates, and prepared by heat treatment from carboxylate solution precursors were investigated. The deposited films were amorphous below 450 °C, transforming gradually to the tetragonal and monoclinic phases on heating. The monoclinic phase developed from the tetragonal phase displacively, and exhibited a strong (111) preferred orientation at temperature as low as 550 °C. The degree of preferred orientation and the tetragonal-to-monoclinic phase transformation were controlled by heating rate, soak temperature, and time. Interfacial diffusion into the film from the Si substrate was negligible at 700 °C and became significant only at 900 °C, but for films thicker than 0.5 μm, overall preferred orientation exceeded 90%.


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