Measuring thin film and multilayer elastic constants by coupling in situ tensile testing with x-ray diffraction

2002 ◽  
Vol 80 (25) ◽  
pp. 4705-4707 ◽  
Author(s):  
K. F. Badawi ◽  
P. Villain ◽  
Ph. Goudeau ◽  
P.-O. Renault
Keyword(s):  
Thin Film ◽  
Elastic Constants ◽  
Tensile Testing ◽  
X Ray Diffraction ◽  
X Ray ◽  
In Situ Tensile Testing

Benefits of two-dimensional detectors for synchrotron X-ray diffraction studies of thin film mechanical behavior

2008 ◽  
Vol 41 (6) ◽  
pp. 1076-1088 ◽  
Author(s):  
Guillaume Geandier ◽  
Pierre-Olivier Renault ◽  
Simon Teat ◽  
Eric Le Bourhis ◽  
Bruno Lamongie ◽  
...  
Keyword(s):  
Thin Film ◽  
Tensile Testing ◽  
Gold Films ◽  
Two Dimensional ◽  
X Ray Diffraction ◽  
Reflection And Transmission ◽  
Strain Measurements ◽  
X Ray ◽  
Polycrystalline Thin Films

Performing a completein situmechanical property analysis of polycrystalline thin films using X-ray diffraction is time consuming with most standard diffraction beamlines at synchrotron facilities and not realistic with laboratory diffractometers. Two-dimensional detection is shown to enable relatively fast and reliable X-ray strain measurements duringin situtensile testing of gold films deposited on polyimide substrates. Advantages and drawbacks in the use of two-dimensional detectors for this type of analysis are discussed for two commonly used geometries: reflection and transmission.

Structural changes during tensile testing of an all-cellulose composite by in situ synchrotron X-ray diffraction

2006 ◽  
Vol 66 (15) ◽  
pp. 2639-2647 ◽  
Author(s):  
Wolfgang Gindl ◽  
Klaus J. Martinschitz ◽  
Peter Boesecke ◽  
Jozef Keckes
Keyword(s):  
Tensile Testing ◽  
Structural Changes ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cellulose Composite

Elastic constants investigation by X-ray diffraction of in situ deformed metallic multi-layers

2004 ◽  
Vol 50 (6) ◽  
pp. 723-727 ◽  
Author(s):  
P. Goudeau ◽  
P. Villain ◽  
T. Girardeau ◽  
P.-O. Renault ◽  
K.-F. Badawi
Keyword(s):  
Elastic Constants ◽  
X Ray Diffraction ◽  
X Ray

Electromechanical Properties of Pb(Mg1/3Nb2/3)O3 Thin Film Capacitors

1998 ◽  
Vol 541 ◽  
Author(s):  
G. Catalan ◽  
M.H. Corbett ◽  
R.M. Bowman ◽  
J.M. Gregg
Keyword(s):  
Thin Film ◽  
Compressive Strain ◽  
X Ray Diffraction ◽  
Leakage Currents ◽  
Plan View ◽  
X Ray ◽  
Thin Film Capacitors ◽  
Transmission Electron ◽  
Tensile Strains

AbstractPulsed Laser Deposition was used to grow Pb(Mg1/3Nb2/3)O3 (PMN) thin film planar capacitor structures. PMN crystallography was verified by x-ray diffraction and plan-view Transmission Electron Microscopy (TEM). Capacitance of the thin film structures was measured as a function of temperature and frequency. Leakage current was also measured for each capacitor. A DC field was subsequently applied and crystallographic strain was monitored in-situ by X-ray diffraction. The electromechanical strain was found to strongly depend on the deposition conditions for each capacitor. Tensile strains of ∼0.2% and compressive strains of ∼0.3% parallel to the applied field were measured for capacitors of different oxygen contents and thicknesses. We propose that the compressive strain is caused by the combined effect of joule heating of the capacitor structure, caused by large leakage currents, and epitaxial coupling between substrate and films. Electrostrictive tensile strains are of the same order as observed inbulk.

Sign in / Sign up

Export Citation Format

Share Document