Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching

2002 ◽  
Vol 91 (12) ◽  
pp. 10044 ◽  
Author(s):  
F. S.-S. Chien ◽  
W.-F. Hsieh ◽  
S. Gwo ◽  
A. E. Vladar ◽  
J. A. Dagata
Keyword(s):  
Ammonium Hydroxide ◽  
Scanning Probe ◽  
Silicon Nanostructures ◽  
Tetra Methyl Ammonium Hydroxide

Fine MCP Decapsulation Technology Development

2006 ◽  
Author(s):  
Jianwei Zhou ◽  
Wei Zheng ◽  
Taekoo Lee
Keyword(s):  
Chemical Etching ◽  
Etch Rate ◽  
Technology Development ◽  
New Technology ◽  
Ammonium Hydroxide ◽  
Mechanical Polishing ◽  
Technology Process ◽  
Tetra Methyl Ammonium Hydroxide ◽  
Die Surface

Abstract Multi-Chip Package (MCP) decapsulation is now becoming a rising problem. Because for traditional decapsulation method, acid can’t dissolve the top silicon die to expose the bottom die surface in MCP. It makes inspecting the bottom die in MCP is difficult. In this paper, a new MCP decapsulation technology combining mechanical polishing with chemical etching is introduced. This new technology can remove the top die quickly without damaging the bottom die using KOH and Tetra-Methyl Ammonium Hydroxide (TMAH). The technology process and relative application are presented. The factors that affect the KOH and TMAH etch rate are studied. The usage difference between the two etchant is discussed.

Biological treatment of TMAH (tetra-methyl ammonium hydroxide) in a full-scale TFT-LCD wastewater treatment plant

2012 ◽  
Vol 113 ◽  
pp. 303-310 ◽  
Author(s):  
Tai-Ho Hu ◽  
Liang-Ming Whang ◽  
Pao-Wen Grace Liu ◽  
Yu-Ching Hung ◽  
Hung-Wei Chen ◽  
...  
Keyword(s):  
Wastewater Treatment ◽  
Wastewater Treatment Plant ◽  
Biological Treatment ◽  
Treatment Plant ◽  
Ammonium Hydroxide ◽  
Full Scale ◽  
Tetra Methyl Ammonium Hydroxide

scholarly journals Морфология, структурные и оптические свойства наноструктур кремния, полученные в растворе, содержащем гексафторосиликат водорода H-=SUB=-2-=/SUB=-(SiF-=SUB=-6-=/SUB=-)

2020 ◽  
Vol 128 (9) ◽  
pp. 1375
Author(s):  
Ш.А. Жуматова ◽  
С.М. Манаков ◽  
Е. Сагидолда ◽  
М.Б. Дарменкулова ◽  
Р.М. Азамат ◽  
...  
Keyword(s):  
Optical Properties ◽  
Porous Silicon ◽  
Ethyl Alcohol ◽  
Scanning Probe Microscopy ◽  
Electrochemical Etching ◽  
Scanning Probe ◽  
Silicon Nanostructures ◽  
Structural And Optical Properties ◽  
Boron Doped ◽  
P Type

Boron doped porous silicon with the observed photoluminescence with a crystallographic orientation of (100), which was fabricated based on a p-type silicon substrate using electrochemical etching in a solution containing hexafluorosilicic acid and ethyl alcohol was studied. A comparative analysis of the morphology, structural and optical properties of silicon nanostructures obtained in a solution containing H2(SiF6) and ethanol and samples obtained in a solution containing HF and ethanol was performed. Morphology, structural and optical properties were studied using scanning probe microscopy and spectrophotometry. It was shown that samples of porous silicon obtained in a solution containing H2(SiF6) and ethanol are characterized by improved optical properties, in particular, they exhibit more intense photoluminescence compared to samples obtained in solutions with HF and ethyl alcohol.

Evaluation of methanogenic treatment of TMAH (tetra-methyl ammonium hydroxide) in a full-scale TFT-LCD wastewater treatment process

2010 ◽  
Vol 62 (2) ◽  
pp. 403-409 ◽  
Author(s):  
T. H. Hu ◽  
L. M. Whang ◽  
C. N. Lei ◽  
C. F. Chen ◽  
T. Y. Chiang ◽  
...  
Keyword(s):  
Ammonium Hydroxide ◽  
Methanosarcina Barkeri ◽  
Full Scale ◽  
Rrna Gene ◽  
Inhibitory Effects ◽  
Cloning And Sequencing ◽  
Wastewater Treatment Process ◽  
Methanosarcina Mazei ◽  
Tetra Methyl Ammonium Hydroxide ◽  
Specific Degradation

This study evaluated TMAH biodegradation under methanogenic conditions. Under methanogenic conditions, a sludge from a full-scale UASB treating TFT-LCD wastewater was able to degrade 2,000 mg/L of TMAH within 10 h and attained a specific degradation rate of 19.2 mgTMAH/gVSS-h. Furthermore, several chemicals including some surfactants, DMSO, and sulfate were examined for their potential inhibitory effects on TMAH biodegradation under methanogenic conditions. The results indicated that surfactant S1 (up to 2%) and DMSO (up to 1,000 mg/L) presented negligible inhibitory effects on TMAH degradation, while surfactant S2 (0.2–1%) might inhibit methanogenic reaction without any TMAH degradation for 3–5 h. At sulfate concentrations higher than 300 mg/L, a complete inhibition of methanogenic reaction and TMAH biodegradation was observed. Results from cloning and sequencing of archaeal 16S rRNA gene fragments showed that Methanosarcina barkeri and Methanosarcina mazei were the dominant methanogens in the UASB treating TMAH-containing TFT-LCD wastewater.

Roughness Characterization of Si(110) Etched in TMAH by Atomic Force Microscopy

1999 ◽  
Vol 605 ◽  
Author(s):  
Z. Moktadir ◽  
K. Sato ◽  
A. Matsumuro ◽  
K. Kayukawa ◽  
M. Shikida
Keyword(s):  
Atomic Force Microscopy ◽  
Ammonium Hydroxide ◽  
Power Spectrum Density ◽  
Scaling Analysis ◽  
Force Microscopy ◽  
Atomic Force ◽  
Roughness Exponent ◽  
Tetra Methyl Ammonium Hydroxide ◽  
Spectrum Density

AbstractWe have investigated the roughness of a silicon (110)-oriented surface after being etched with 20% TMAH (Tetra-methyl Ammonium Hydroxide). We have used an Atomic Force Microscope to determine the roughness exponent α using three different methods: fractal, power spectrum density and scaling analysis. The value of the parameter α was identified to be close to 1/2. This value is different from the KPZ value, which is 0.4 in 2+1 dimension

Sign in / Sign up

Export Citation Format

Share Document