scholarly journals Nanometer-scale electrical characterization of stressed ultrathin SiO2 films using conducting atomic force microscopy

2001 ◽  
Vol 78 (26) ◽  
pp. 4181-4183 ◽  
Author(s):  
M. Porti ◽  
M. Nafrı́a ◽  
X. Aymerich ◽  
A. Olbrich ◽  
B. Ebersberger
1998 ◽  
Vol 73 (21) ◽  
pp. 3114-3116 ◽  
Author(s):  
Alexander Olbrich ◽  
Bernd Ebersberger ◽  
Christian Boit

2008 ◽  
Vol 112 (49) ◽  
pp. 19680-19685 ◽  
Author(s):  
Pavels Birjukovs ◽  
Nikolay Petkov ◽  
Ju Xu ◽  
Janis Svirksts ◽  
John J. Boland ◽  
...  

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