Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

S. Gupta; R. S. Katiyar; D. R. Gilbert; R. K. Singh; G. Morell

doi:10.1063/1.1318387

Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1318387 ◽

2000 ◽

Vol 88 (10) ◽

pp. 5695-5702 ◽

Cited By ~ 16

Author(s):

S. Gupta ◽

R. S. Katiyar ◽

D. R. Gilbert ◽

R. K. Singh ◽

G. Morell

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Diamond Thin Films ◽

Microstructural Studies

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Cited By ~ 3

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Materials Science Forum ◽

10.4028/www.scientific.net/msf.140-142.255 ◽

1993 ◽

Vol 140-142 ◽

pp. 255-268 ◽

Cited By ~ 11

Author(s):

P. Shufflebotham ◽

M. Weise ◽

D. Pirkle ◽

D. Denison

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Dielectric Thin Films

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Nanocrystalline Silicon Thin Films Fabricated at 80°C by Using Electron Cyclotron Resonance Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/12/5/19 ◽

2010 ◽

Vol 12 (5) ◽

pp. 608-613 ◽

Cited By ~ 2

Author(s):

I. Y. Y Bu ◽

A. J Flewitt ◽

W. I Miline

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Electron Cyclotron ◽

Silicon Thin Films

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The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01399-7 ◽

2000 ◽

Vol 379 (1-2) ◽

pp. 259-264 ◽

Cited By ~ 12

Author(s):

S.P. Kim ◽

S.K. Choi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Intrinsic Stress ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/49/28/285203 ◽

2016 ◽

Vol 49 (28) ◽

pp. 285203 ◽

Cited By ~ 4

Author(s):

Junkang Wang ◽

Pavel Bulkin ◽

Ileana Florea ◽

Jean-Luc Maurice ◽

Erik Johnson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Resonance Plasma

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A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08949-3 ◽

1997 ◽

Vol 295 (1-2) ◽

pp. 67-72 ◽

Cited By ~ 1

Author(s):

Ju-Hyeon Lee ◽

Cheon-Man Shim ◽

Sang-Kook Park ◽

Dong-Geun Jung ◽

Sung Park

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Large Area ◽

Area Deposition ◽

Resonance Plasma

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Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

Microelectronic Engineering ◽

10.1016/s0167-9317(03)00412-x ◽

2003 ◽

Vol 70 (1) ◽

pp. 109-114 ◽

Cited By ~ 17

Author(s):

K.B. Sundaram ◽

R.E. Sah ◽

H. Baumann ◽

K. Balachandran ◽

R.M. Todi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Wet Etching ◽

Ecr Plasma

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Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/bf02655461 ◽

1995 ◽

Vol 24 (10) ◽

pp. 1435-1441 ◽

Cited By ~ 33

Author(s):

IL Kim ◽

Jong-Seok Kim ◽

Oh-Seung Kwon ◽

Sung-Tae Ahn ◽

John S. Chun ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Resonance Plasma

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