Optical constants and ellipsometric thickness determination of strained Si[sub 1−x]Ge[sub x]:C layers on Si (100) and related heterostructures

2000 ◽  
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Author(s):  
Stefan Zollner ◽  
Jill Hildreth ◽  
Ran Liu ◽  
P. Zaumseil ◽  
M. Weidner ◽  
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Thickness Determination

Optical constants and thickness determination of very thin amorphous semiconductor films

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Vol 92 (6) ◽  
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Author(s):  
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S. D. Ventura ◽  
E. G. Birgin ◽  
J. M. Martínez
Keyword(s):  
Optical Constants ◽  
Amorphous Semiconductor ◽  
Semiconductor Films ◽  
Thickness Determination

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Vol 35 (12) ◽  
pp. 2142-2146 ◽  
Author(s):  
J. Joshua Yang ◽  
Chengxiang Ji ◽  
Ying Yang ◽  
Y. Austin Chang ◽  
Feng X. Liu ◽  
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Keyword(s):  
Tunnel Junctions ◽  
Oxide Films ◽  
Magnetic Tunnel Junctions ◽  
Thickness Determination ◽  
Ultrathin Oxide Films ◽  
Ultrathin Oxide

scholarly journals Determination of the Thickness and Optical Constants of ZrO2 by Spectroscopic Ellipsometry and Spectrophotometric Method

2011 ◽  
Vol 8 ◽  
pp. 223-227 ◽  
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M. Horprathum ◽  
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S. Chanyawadee ◽  
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Spectrophotometric Method ◽  
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Vol 252 (6) ◽  
pp. 2375-2388 ◽  
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Keyword(s):  
Sio2 Films ◽  
Thickness Determination
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