Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

2000 ◽  
Vol 77 (7) ◽  
pp. 927 ◽  
Author(s):  
Zhaoning Yu ◽  
Paru Deshpande ◽  
Wei Wu ◽  
Jian Wang ◽  
Stephen Y. Chou
Keyword(s):  
Double Layer ◽  
Nanoimprint Lithography ◽  
Grating Structure ◽  
Metal Grating

Waveguiding effect in 2D metal–dielectric–metal grating structure

2011 ◽  
Vol 107 (1) ◽  
pp. 127-132 ◽  
Author(s):  
Eunice S. P. Leong ◽  
Y. J. Liu ◽  
C. C. Chum ◽  
B. Wang ◽  
J. H. Teng
Keyword(s):  
Grating Structure ◽  
Metal Grating

scholarly journals Generation of three-port splitter by double-layer grating in second-order Littrow configuration

2020 ◽  
Vol 50 (2) ◽  
Author(s):  
Chenhao Gao ◽  
Bo Wang ◽  
Chen Fu ◽  
Jimin Fang_ ◽  
Kunhua Wen ◽  
...  
Keyword(s):  
Double Layer ◽  
Beam Splitter ◽  
High Efficiency ◽  
Single Layer ◽  
Fused Silica ◽  
Second Order ◽  
Grating Structure ◽  
Grating Region ◽  
Fabrication Tolerance ◽  
Littrow Configuration

In this paper, a novel double-layer three-port grating is described. The incident grating structure is in the second-order Littrow configuration. The grating region is composed of fused silica and Ta2O5. The designed grating beam splitter has high efficiency under TE polarization and TM polarization, respectively. The efficiency of two polarizations is more than 90%. In addition, compared with a single-layer three-port grating, this new beam splitter has good fabrication tolerance and incident bandwidth. Therefore, the optimized structure has a good application value.

Double layer lift-off nanofabrication controlled gaps of nanoelectrodes with sub-100 nm by nanoimprint lithography

2015 ◽  
Vol 26 (18) ◽  
pp. 185301 ◽  
Author(s):  
Shujie Wang ◽  
Qing Shi ◽  
Jing Chai ◽  
Ke Cheng ◽  
Zuliang Du
Keyword(s):  
Double Layer ◽  
Nanoimprint Lithography ◽  
Lift Off
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