Direct in situ characterization of Ge surface segregation in strained Si1−xGex epitaxial thin films

1998 ◽  
Vol 73 (14) ◽  
pp. 2027-2029 ◽  
Author(s):  
A. M. Lam ◽  
Y.-J. Zheng ◽  
J. R. Engstrom
Keyword(s):  
Thin Films ◽  
Surface Segregation ◽  
Epitaxial Thin Films ◽  
In Situ Characterization

In situ characterization of strontium surface segregation in epitaxial La0.7Sr0.3MnO3 thin films as a function of oxygen partial pressure

2008 ◽  
Vol 93 (15) ◽  
pp. 151904 ◽  
Author(s):  
Tim T. Fister ◽  
Dillon D. Fong ◽  
Jeffrey A. Eastman ◽  
Peter M. Baldo ◽  
Matthew J. Highland ◽  
...  
Keyword(s):  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Surface Segregation ◽  
In Situ Characterization

In situ characterization of sputtered thin films using a normal incidence laser reflectometer

1992 ◽  
Vol 10 (4) ◽  
pp. 939-944 ◽  
Author(s):  
Dubravko I. Babić ◽  
Thomas E. Reynolds ◽  
Evelyn L. Hu ◽  
John E. Bowers
Keyword(s):  
Thin Films ◽  
Normal Incidence ◽  
In Situ Characterization

UHV-preparation and in situ characterization of magneto-optical thin films

1988 ◽  
Vol 24 (2) ◽  
pp. 1731-1733 ◽  
Author(s):  
D. Weller ◽  
P. Schrijner ◽  
W. Reim
Keyword(s):  
Thin Films ◽  
In Situ Characterization

CVD elaboration and in situ characterization of barium silicate thin films

2010 ◽  
Vol 30 (2) ◽  
pp. 441-446 ◽  
Author(s):  
Thomas Genevès ◽  
Luc Imhoff ◽  
Bruno Domenichini ◽  
Paul Maurice Peterlé ◽  
Sylvie Bourgeois
Keyword(s):  
Thin Films ◽  
In Situ Characterization ◽  
Barium Silicate

In situ characterization of YBaCuO thin films during rapid thermal annealing

1992 ◽  
pp. 807-812
Author(s):  
F. Hosseini Teherani ◽  
E. Caristan ◽  
F. Carrié ◽  
T. Pech ◽  
J. Baixeras ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
In Situ Characterization

NOVEL VACUUM SYSTEM FOR IN-SITU CHARACTERIZATION OF FLUORESCENCE PROPERTIES OF THIN FILMS

2002 ◽  
Vol 16 (28n29) ◽  
pp. 4445-4448 ◽  
Author(s):  
KOHEI ONOZUKA ◽  
NOBUYUKI IWATA ◽  
HIROSHI YAMAMOTO
Keyword(s):  
Thin Films ◽  
Thermal Evaporation ◽  
Film Surface ◽  
Fluorescence Properties ◽  
Luminescence Properties ◽  
Vacuum System ◽  
In Situ Characterization ◽  
First Time

We constructed a novel vacuum system in which the cathode luminescence properties of as-prepared films can be measured in-situ. It has been observed that the Zn-Ga-O films deposited on 500°C ITO by sputtering emits light with wavelength of about 500 nm from an ultra thin Zn-rich layer formed near film surface. The luminescence induced by irradiation of electrons has also been observed for the first time in the organic bilayered TPD/Alq 3 films prepared in thermal evaporation. Its wavelength blue-shifts by about 120 nm in comparison with the electroluminescence of the same materials. The developed vacuum system is useful to characterize various thin films.

Deposition and in-situ characterization of ultra-thin films

2004 ◽  
Vol 459 (1-2) ◽  
pp. 17-22 ◽  
Author(s):  
Stanislav Voborný ◽  
Miroslav Kolı́bal ◽  
Jindřich Mach ◽  
Jan Čechal ◽  
Petr Bábor ◽  
...  
Keyword(s):  
Thin Films ◽  
In Situ Characterization
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