Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

1998 ◽  
Vol 72 (25) ◽  
pp. 3353-3355 ◽  
Author(s):  
Yanjun Ma ◽  
Hongning Yang ◽  
J. Guo ◽  
C. Sathe ◽  
A. Agui ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Electronic Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Low Dielectric Constant ◽  
Amorphous Carbon Films ◽  
Low Dielectric ◽  
Structural And Electronic Properties

Modifications of Low Dielectric Constant Fluorinated Amorphous Carbon Films by Multiple Plasma Treatments

2002 ◽  
Vol 149 (7) ◽  
pp. G384 ◽  
Author(s):  
Jia-Min Shieh ◽  
Kou-Chiang Tsai ◽  
Bau-Tong Dai ◽  
Shih-Chin Lee ◽  
Chih-Hung Ying ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Low Dielectric Constant ◽  
Amorphous Carbon Films ◽  
Low Dielectric ◽  
Plasma Treatments

Spectroscopic Studies of Low Dielectric Constant Fluorinated Amorphous Carbon Films for Ulsi Integrated Circuits

1998 ◽  
Vol 524 ◽  
Author(s):  
Yanjun Ma ◽  
Hongning Yang ◽  
J. Guo ◽  
C. Sathe ◽  
A. Agui ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Integrated Circuits ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Spectroscopic Studies ◽  
Carbon Films ◽  
Low Dielectric Constant ◽  
Low Dielectric ◽  
On Chip ◽  
Rc Delay

ABSTRACTPerformance of future generations of integrated circuits will be limited by the RC delay caused by on-chip interconnections. Overcoming this limitation requires the deployment of new high conductivity metals such as copper and low dielectric constant intermetal dielectrics (IMD). Fluorinated amorphous carbon (a-CFx) is a promising candidate for replacing SiO2 as the IMD. In this paper we investigated the structure and electronic properties of a-CFx thin films using high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with deposition conditions. The data suggest that the structure of the a-CFx is mostly of carbon rings and CF2 chains cross-linked with C atoms. The effects of growth temperature on the structure and the thermal stability of the film are discussed.

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