Mg in GaN: Incorporation of a volatile species at high temperatures during molecular beam epitaxy

1997 ◽  
Vol 71 (12) ◽  
pp. 1685-1687 ◽  
Author(s):  
S. Guha ◽  
N. A. Bojarczuk ◽  
F. Cardone
Keyword(s):  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam ◽  
Volatile Species

Size-Limiting Effect of Site-Controlled InAs Quantum Dots Grown at High Temperatures by Molecular Beam Epitaxy

2012 ◽  
Vol 5 (8) ◽  
pp. 085501 ◽  
Author(s):  
Kyu Man Cha ◽  
Isao Horiuchi ◽  
Kenji Shibata ◽  
Kazuhiko Hirakawa
Keyword(s):  
Quantum Dots ◽  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam ◽  
Inas Quantum Dots

Defect and Island Formation in Stranski-Krastanov Growth of Ge on Si (001)

1993 ◽  
Vol 317 ◽  
Author(s):  
Akira Sakai ◽  
Toru Tatsumi
Keyword(s):  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam ◽  
Island Formation ◽  
Nucleation Mode

ABSTRACTWe have examined macroscopic island (Macro-island) formation in Stranski-Krastanov (SK) growth of Ge on Si (001) surfaces at various growth temperatures in molecular beam epitaxy (MBE). The nucleation mode of Macro-island formation was observed to be predominantly heterogeneous at medium growth temperatures less than 450°C, but homogeneous at high temperatures. In the heterogeneous Mode, Macro-island formation is mediated by particular V-shaped defects running preferentially along the <110> direction, which form as a result of coalescence of the well-faceted islands.

Mg incorporation in GaN grown by plasma-assisted molecular beam epitaxy at high temperatures

2016 ◽  
Vol 439 ◽  
pp. 87-92 ◽  
Author(s):  
W.C. Yang ◽  
P.Y. Lee ◽  
H.Y. Tseng ◽  
C.W. Lin ◽  
Y.T. Tseng ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam

Gallium desorption from GaAs and (Al,Ga)As during molecular beam epitaxy growth at high temperatures

1990 ◽  
Vol 57 (12) ◽  
pp. 1203-1205 ◽  
Author(s):  
E. M. Gibson ◽  
C. T. Foxon ◽  
J. Zhang ◽  
B. A. Joyce
Keyword(s):  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam ◽  
Molecular Beam Epitaxy Growth

Gallium desorption from (Al,Ga)As grown by molecular beam epitaxy at high temperatures

1991 ◽  
Vol 111 (1-4) ◽  
pp. 189-193 ◽  
Author(s):  
A.H. Kean ◽  
C.R. Stanley ◽  
M.C. Holland ◽  
J.L. Martin ◽  
J.N. Chapman
Keyword(s):  
Molecular Beam Epitaxy ◽  
High Temperatures ◽  
Molecular Beam

Defects in Heavily-Doped MBE GaAs

1982 ◽  
Vol 40 ◽  
pp. 442-445
Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Heavily Doped

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.

An in situ and ex situ TEM study of the formation of thin cobalt silicide films by molecular beam epitaxy on the silicon (100) surface

1988 ◽  
Vol 46 ◽  
pp. 884-885
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Defect Density ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Metal Base ◽  
In Situ Experiments ◽  
Potential Applications

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.

Near-Surface Aggregation of Sn In Heavily Sn-Doped GaAs Films Grown By Molecular Beam Epitaxy

1985 ◽  
Vol 43 ◽  
pp. 368-369
Author(s):  
S. H. Chen
Keyword(s):  
Molecular Beam Epitaxy ◽  
Cross Section ◽  
Electron Spectroscopy ◽  
Molecular Beam ◽  
Surface Segregation ◽  
Secondary Ion Mass Spectrometry ◽  
Specimen Preparation ◽  
Near Surface ◽  
Gaas Films ◽  
Secondary Ion

Sn has been used extensively as an n-type dopant in GaAs grown by molecular-beam epitaxy (MBE). The surface accumulation of Sn during the growth of Sn-doped GaAs has been observed by several investigators. It is still not clear whether the accumulation of Sn is a kinetically hindered process, as proposed first by Wood and Joyce, or surface segregation due to thermodynamic factors. The proposed donor-incorporation mechanisms were based on experimental results from such techniques as secondary ion mass spectrometry, Auger electron spectroscopy, and C-V measurements. In the present study, electron microscopy was used in combination with cross-section specimen preparation. The information on the morphology and microstructure of the surface accumulation can be obtained in a fine scale and may confirm several suggestions from indirect experimental evidence in the previous studies.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

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