Diffuse reflectance spectroscopy measurement of substrate temperature and temperature transient during molecular beam epitaxy and implications for low-temperature III–V epitaxy
1997 ◽
Vol 175-176
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pp. 250-255
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1993 ◽
Vol 11
(3)
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pp. 1007
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2005 ◽
Vol 23
(3)
◽
pp. 1252
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1991 ◽
Vol 29
(1-4)
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pp. 489-501
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