Dual‐wavelength AlGaAs/GaAs laser by selective removal of a quantum well in an asymmetric dual quantum well structure

1996 ◽  
Vol 68 (3) ◽  
pp. 284-286 ◽  
Author(s):  
K. J. Beernink ◽  
D. Sun ◽  
R. L. Thornton ◽  
D. W. Treat
2008 ◽  
Vol 92 (1) ◽  
pp. 013108 ◽  
Author(s):  
Kun-Ching Shen ◽  
Cheng-Yen Chen ◽  
Chi-Feng Huang ◽  
Jhy-Yang Wang ◽  
Yen-Cheng Lu ◽  
...  

2012 ◽  
Vol 542-543 ◽  
pp. 953-958
Author(s):  
Xia Zheng Bu ◽  
Jian Wang ◽  
Ju Liang Shi ◽  
Hui Zhao

An Al0.3Ga0.7As/GaAs/Al0.3Ga0.7As/GaAs/Al0.3Ga0.7As asymmetric dual-quantum-well structure was designed. The barrier thickness between the dual quantum wells is 48Å, it is thick enough to inhibit the mutual cross-interference between the energy levels within the two quantum wells. This material system was grown on a GaAs substrate by solid source molecular beam epitaxy, and the device was fabricated with rat electrodes using inductively coupled plasma etching mesa process. The tunneling effect that electron transfer through the dual-quantum-well structure was observed in the device I-V feature, it was calculated and demonstrated by transmission matrix method and Ariy Function numerical transform.


1987 ◽  
Author(s):  
Yasunori TOKUDA ◽  
Yuji ABE ◽  
Teruhito MATSUI ◽  
Noriaki TSUKADA ◽  
Takashi NAKAYAMA

1994 ◽  
Vol 22 (12) ◽  
pp. 977-984
Author(s):  
Yoshiaki HASEGAWA ◽  
Takashi EGAWA ◽  
Takashi JIMBO ◽  
Masayoshi UMENO

1989 ◽  
Vol 25 (17) ◽  
pp. 1147
Author(s):  
A.L. Powell ◽  
J.S. Roberts ◽  
P.I. Rockett ◽  
T.J. Foster ◽  
L. Eaves

1999 ◽  
Vol 38 (Part 1, No. 12A) ◽  
pp. 6645-6649 ◽  
Author(s):  
Yasuhiro Fujimoto ◽  
Hiroo Yonezu ◽  
Satoshi Irino ◽  
Katsuya Samonji ◽  
Kenji Momose ◽  
...  

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