Metalorganic vapor phase epitaxy and characterization of Zn1−xFexSe films

1996 ◽  
Vol 68 (16) ◽  
pp. 2270-2272 ◽  
Author(s):  
T. J. Mountziaris ◽  
J. Peck ◽  
S. Stoltz ◽  
W. Y. Yu ◽  
A. Petrou ◽  
...  
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1998 ◽  
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L. Li ◽  
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H. Yoon ◽  
...  

2003 ◽  
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A. Wakahara ◽  
H. Okada ◽  
...  

2000 ◽  
Vol 221 (1-4) ◽  
pp. 481-484 ◽  
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S. Matsumoto ◽  
H. Yaguchi ◽  
S. Kashiwase ◽  
T. Hashimoto ◽  
S. Yoshida ◽  
...  

2004 ◽  
Vol 260 (1-2) ◽  
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Takao Misaki ◽  
Akihiro Wakahara ◽  
Hiroshi Okada ◽  
Akira Yoshida

2005 ◽  
Vol 892 ◽  
Author(s):  
Kazuhide Kusakabe ◽  
Shizutoshi Ando ◽  
Kazuhiro Ohkawa

AbstractNonpolara-plane GaN films were grown on r-plane sapphire substrates by atmospheric metalorganic vapor-phase epitaxy. The as-grown layers were studied by high-resolution x-ray diffraction. Thea-plane GaN lattice mosaic is orientation dependent as determined by x-ray rocking curve (XRC) measurements. The tilt mosaic measured with the c-axis within the scattering plane (c-mosaic) was greater than the mosaic measured with the m-axis within the scattering plane (m-mosaic). The mosaic along both azimuths decreased and thec-mosaic/m-mosaic ratio was increased with increase of growth temperature from 1050 °C to 1080 °C. The morphological transition was correlated to change in thea-plane GaN tilt mosaic measured by XRC.


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