Impedance independent optical carrier lifetime measurements in semiconductor lasers

1998 ◽  
Vol 69 (12) ◽  
pp. 4247-4248 ◽  
Author(s):  
J. M. Pikal ◽  
C. S. Menoni ◽  
H. Temkin ◽  
P. Thiagarajan ◽  
G. Y. Robinson
1995 ◽  
Vol 31 (20) ◽  
pp. 1747-1748 ◽  
Author(s):  
G.E. Shtengel ◽  
D.A. Ackerman ◽  
P.A. Morton

1995 ◽  
Vol 67 (11) ◽  
pp. 1506-1508 ◽  
Author(s):  
G. E. Shtengel ◽  
D. A. Ackerman ◽  
P. A. Morton ◽  
E. J. Flynn ◽  
M. S. Hybertsen

2021 ◽  
Vol 118 (25) ◽  
pp. 252105
Author(s):  
K. Yokoyama ◽  
J. S. Lord ◽  
J. Miao ◽  
P. Murahari ◽  
A. J. Drew

2018 ◽  
Vol 924 ◽  
pp. 269-272 ◽  
Author(s):  
Shinichi Mae ◽  
Takeshi Tawara ◽  
Hidekazu Tsuchida ◽  
Masashi Kato

For high voltage SiC bipolar devices, carrier lifetime is an important parameter, and for optimization of device performance, we need to control distribution of the carrier lifetime in a wafer. So far, there have been limited systems for depth-resolved carrier lifetime measurements without cross sectional cut. In this study, we adopted a free carrier absorption technique and made local overlapping of the probe laser light with excitation laser light to develop depth-resolved carrier lifetime measurements. We named the developed system a microscopic FCA system and demonstrated measurement results for samples with and without intentional carrier lifetime distribution.


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