Development of surface-wave ion source using coaxial-type cavity

1997 ◽  
Vol 68 (1) ◽  
pp. 79-82 ◽  
Author(s):  
Yoshikazu Yoshida ◽  
Toshikazu Miyazawa ◽  
Atsushi Kazama
Keyword(s):  
Surface Wave ◽  
Ion Source

Electron density measurement of cesium seeded negative ion source by surface wave probe

2012 ◽  
Vol 83 (2) ◽  
pp. 02B113 ◽  
Author(s):  
M. Kisaki ◽  
K. Tsumori ◽  
H. Nakano ◽  
K. Ikeda ◽  
M. Osakabe ◽  
...  
Keyword(s):  
Surface Wave ◽  
Electron Density ◽  
Density Measurement ◽  
Ion Source ◽  
Negative Ion

Atmospheric-Pressure Argon Surface-Wave Plasma (SWP) as an Ion Source in Elemental Mass Spectrometry

1993 ◽  
Vol 47 (5) ◽  
pp. 609-614 ◽  
Author(s):  
D. Boudreau ◽  
J. Hubert
Keyword(s):  
Surface Wave ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Dynamic Range ◽  
Ion Source ◽  
Ultrasonic Nebulization ◽  
Inductively Coupled ◽  
Mass Spectrometer System ◽  
Spectrometer System ◽  
Elemental Mass

Results of the study of a high-power argon surface-wave plasma as an ion source for mass spectrometric elemental analysis of aqueous solutions are presented. The plasma is operated at power levels between 475 and 800 W and at gas flow rates between 4 and 6 L/min. The wet aerosol obtained by ultrasonic nebulization is directly carried into the plasma, without the use of a desolvation system. Effects on the mass spectrum of parameters such as sampling depth and applied power were studied. With this source, indicative detection limits for most of the studied elements were in the range of 0.5 to 5 ng/mL, and the dynamic range covered 4 to 5 orders of magnitude. Analytical figures of merit obtained with the surface-wave plasma are compared with those of an inductively coupled plasma with the use of the same mass spectrometer system.

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

Exit-surface wave reconstruction using a focal series

1992 ◽  
Vol 50 (2) ◽  
pp. 988-989
Author(s):  
W.J. de Ruijter ◽  
M.R. McCartney ◽  
David J. Smith ◽  
J.K. Weiss
Keyword(s):  
Surface Wave ◽  
Spherical Aberration ◽  
Data Extraction ◽  
High Sensitivity ◽  
Geometric Distortion ◽  
Variation Method ◽  
Objective Lens ◽  
Immediate Reconstruction ◽  
Exit Surface ◽  
Electron Microscopes

Further advances in resolution enhancement of transmission electron microscopes can be expected from digital processing of image data recorded with slow-scan CCD cameras. Image recording with these new cameras is essential because of their high sensitivity, extreme linearity and negligible geometric distortion. Furthermore, digital image acquisition allows for on-line processing which yields virtually immediate reconstruction results. At present, the most promising techniques for exit-surface wave reconstruction are electron holography and the recently proposed focal variation method. The latter method is based on image processing applied to a series of images recorded at equally spaced defocus.Exit-surface wave reconstruction using the focal variation method as proposed by Van Dyck and Op de Beeck proceeds in two stages. First, the complex image wave is retrieved by data extraction from a parabola situated in three-dimensional Fourier space. Then the objective lens spherical aberration, astigmatism and defocus are corrected by simply dividing the image wave by the wave aberration function calculated with the appropriate objective lens aberration coefficients which yields the exit-surface wave.

Surface Wave Utility in Composite Materia] Characterization

1989 ◽  
Vol 1 (1) ◽  
pp. 247-265
Author(s):  
Joseph Rose ◽  
Aleksander Pilarski ◽  
Yimei Huang
Keyword(s):  
Surface Wave

Analysis of focused surface wave transducers

1990 ◽  
Vol 137 (6) ◽  
pp. 467 ◽  
Author(s):  
M. Kirci ◽  
E. Akcakaya
Keyword(s):  
Surface Wave
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