Characterization and in situ monitoring of a novel compact electron cyclotron resonance plasma source

Patrick O’Keeffe; C. O’Morain; S. Den; Y. Hayashi; S. Komuro; T. Morikawa

doi:10.1063/1.1146094

Characterization and in situ monitoring of a novel compact electron cyclotron resonance plasma source

Review of Scientific Instruments ◽

10.1063/1.1146094 ◽

1995 ◽

Vol 66 (11) ◽

pp. 5252-5256 ◽

Cited By ~ 5

Author(s):

Patrick O’Keeffe ◽

C. O’Morain ◽

S. Den ◽

Y. Hayashi ◽

S. Komuro ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

In Situ Monitoring ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Cited By ~ 9

Author(s):

Y. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

In Situ Investigation ◽

Resonance Plasma

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Electron cyclotron resonance plasma source for conductive film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579309 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1281-1286 ◽

Cited By ~ 31

Author(s):

Toshiro Ono ◽

Hiroshi Nishimura ◽

Masaru Shimada ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Conductive Film ◽

Resonance Plasma

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Electrical Characterisation of Gate Dielectrics Deposited with Multipolar Electron Cyclotron Resonance Plasma Source

30th European Solid-State Device Research Conference ◽

10.1109/essderc.2000.194805 ◽

2000 ◽

Author(s):

G.I. Isai ◽

A.Y. Kovalgin ◽

J. Holleman ◽

P.H. Woerlee ◽

H. Wallinga ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Gate Dielectrics ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l802 ◽

1993 ◽

Vol 32 (Part 2, No. 6A) ◽

pp. L802-L805 ◽

Cited By ~ 3

Author(s):

Akira Ishii ◽

Yoshiyuki Sakaguchi ◽

Shoichiro Minomo ◽

Michio Taniguchi ◽

Masato Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Diamond Like Carbon Film ◽

Resonance Plasma

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Design and performance of an electron cyclotron resonance plasma source for standard molecular beam epitaxy equipment

Review of Scientific Instruments ◽

10.1063/1.1141371 ◽

1990 ◽

Vol 61 (9) ◽

pp. 2407-2411 ◽

Cited By ~ 50

Author(s):

Z. Sitar ◽

M. J. Paisley ◽

D. K. Smith ◽

R. F. Davis

Keyword(s):

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

And Performance ◽

Resonance Plasma

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Super‐wide electron cyclotron resonance plasma source excited by traveling microwave as an efficient tool for diamondlike carbon film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579302 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1241-1243

Author(s):

A. Ishii ◽

S. Amadatsu ◽

S. Minomo ◽

M. Taniguchi ◽

M. Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Efficient Tool ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

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SiC x-ray lithography mask fabricated by electron cyclotron resonance plasma source coupled with divided microwaves

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589378 ◽

1997 ◽

Vol 15 (3) ◽

pp. 736 ◽

Cited By ~ 2

Author(s):

Masaru Shimada

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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New in situ electron beam patterning process for GaAs using an electron-cyclotron-resonance plasma-oxidized mask and Cl2 gas etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586032 ◽

1992 ◽

Vol 10 (6) ◽

pp. 2711 ◽

Cited By ~ 2

Author(s):

N. Takado

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Electron Beam Patterning ◽

Resonance Plasma

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An Evaluation Of an End Excited Electron Cyclotron Resonance Plasma Source

Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) ◽

10.1109/plasma.1994.588708 ◽

2005 ◽

Author(s):

P. Mak ◽

J. Asmussen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Excited Electron ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Permanent magnet electron cyclotron resonance plasma source with remote window

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579420 ◽

1995 ◽

Vol 13 (2) ◽

pp. 343-348 ◽

Cited By ~ 9

Author(s):

Lee A. Berry ◽

S. M. Gorbatkin

Keyword(s):

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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