Design features of a high‐intensity, cesium‐sputter/plasma‐sputter negative ion source (abstract)a)

1994 ◽  
Vol 65 (4) ◽  
pp. 1222-1222
Author(s):  
G. D. Alton ◽  
G. D. Mills ◽  
J. Dellwo
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion ◽  
Design Features

The properties of high‐intensity heavy‐negative‐ion source, NIABNIS

1990 ◽  
Vol 61 (1) ◽  
pp. 427-429 ◽  
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Takeshi Maekawa ◽  
Toshinori Takagi
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion

Design features of a high‐intensity, cesium‐sputter/plasma‐sputter negative ion sourcea)

1994 ◽  
Vol 65 (6) ◽  
pp. 2006-2011 ◽  
Author(s):  
G. D. Alton ◽  
G. D. Mills ◽  
J. Dellwo
Keyword(s):  
High Intensity ◽  
Negative Ion ◽  
Design Features

A compact multi-sample high-intensity negative ion source

1997 ◽  
Vol 123 (1-4) ◽  
pp. 550-553 ◽  
Author(s):  
W.Z. Gelbart ◽  
R.R. Johnson ◽  
M. Paul ◽  
D. Berkovits ◽  
A. Hershkowitz ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion

scholarly journals A high-intensity, RF plasma-sputter negative ion source

1999 ◽  
Author(s):  
G. D. Alton ◽  
R. Lohwasser ◽  
B. Cui ◽  
Y. Bao ◽  
T. Zhang ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

A modified high-intensity Cs sputter negative-ion source with multi-target mechanism

1993 ◽  
Vol 328 (1-2) ◽  
pp. 207-210 ◽  
Author(s):  
Si Houzhi ◽  
Zhang Weizhong ◽  
Zhu Jinhau ◽  
Du Guangtian ◽  
Zhang Tiaorong ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion
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