Spectrophotometer design for the characterization of coated optical components

Peter C. LaDelfe; D. B. Stahl

doi:10.1063/1.1142033

The Low Density Matter (LDM) beamline at FERMI: optical layout and first commissioning

Journal of Synchrotron Radiation ◽

10.1107/s1600577515005743 ◽

2015 ◽

Vol 22 (3) ◽

pp. 538-543 ◽

Cited By ~ 32

Author(s):

Cristian Svetina ◽

Cesare Grazioli ◽

Nicola Mahne ◽

Lorenzo Raimondi ◽

Claudio Fava ◽

...

Keyword(s):

Transport System ◽

Free Electron ◽

Free Electron Laser ◽

Low Density ◽

Optical Components ◽

Photon Transport ◽

Physics Community ◽

Optical Layout ◽

Density Matter

The Low Density Matter (LDM) beamline has been built as part of the FERMI free-electron laser (FEL) facility to serve the atomic, molecular and cluster physics community. After the commissioning phase, it received the first external users at the end of 2012. The design and characterization of the LDM photon transport system is described, detailing the optical components of the beamline.

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Characterization of optical components for the ESS Target Imaging System

Radiation Measurements ◽

10.1016/j.radmeas.2020.106329 ◽

2020 ◽

Vol 136 ◽

pp. 106329 ◽

Cited By ~ 1

Author(s):

N. Borghi ◽

B. Lauritzen ◽

L. Lindvold ◽

N. Poolton

Keyword(s):

Imaging System ◽

Optical Components ◽

Target Imaging

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Characterization of the PTB EUV reflectometry facility for large EUVL optical components

10.1117/12.482668 ◽

2003 ◽

Cited By ~ 18

Author(s):

Johannes Tummler ◽

Heike Blume ◽

Guido Brandt ◽

Jens Eden ◽

Bernd Meyer ◽

...

Keyword(s):

Optical Components

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Vector Signal Characterization of High-Speed Optical Components by Use of Linear Optical Sampling With Milliradian Resolution

IEEE Photonics Technology Letters ◽

10.1109/lpt.2008.2005787 ◽

2008 ◽

Vol 20 (23) ◽

pp. 2007-2009 ◽

Cited By ~ 13

Author(s):

P. A. Williams ◽

T. Dennis ◽

I. Coddington ◽

W. C. Swann ◽

N. R. Newbury

Keyword(s):

High Speed ◽

Optical Components ◽

Optical Sampling ◽

Linear Optical ◽

Signal Characterization ◽

Vector Signal

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Environmentally benign vacuum deposition with air-to-vacuum-to-air technology

Journal of Materials Research ◽

10.1557/jmr.1995.0493 ◽

1995 ◽

Vol 10 (3) ◽

pp. 493-496 ◽

Cited By ~ 4

Author(s):

K.L. Barth ◽

W.S. Sampath

Keyword(s):

Cycle Time ◽

Cutting Tools ◽

Toxic Waste ◽

Environmentally Benign ◽

Vacuum Deposition ◽

Photovoltaic Devices ◽

Optical Components ◽

Microelectronics Industry ◽

Compact Disks

The deposition of thin films and coatings frequently results in the generation of toxic waste, volatile organic compounds, or large amounts of waste water and sludge. Vapor deposition in vacuum offers a more environmentally benign alternative, but is not prevalent outside of the microelectronics industry due to economic reasons. However, vacuum coating could be more widely accepted, and could potentially replace nonvacuum deposition methods, if either the cycle time or costs associated with vacuum coating were reduced. In order to reduce the cycle time for vacuum deposition, a robust system for continuous air-to-vacuum-to-air (AVA) transportation of discreet substrates has been developed and constructed in this study. This technology allows the insertion of discrete components into vacuum at high rates, without the need for venting the deposition chamber. Substrates have been repeatedly transported from atmosphere to 10−5 Torr in under a second. The capability of the AVA technology was studied through the deposition and characterization of CdS and CdTe films and photovoltaic devices. With the AVA technology, the need for venting the vacuum chamber to insert the substrates and subsequent pumping of the system for deposition is eliminated. The AVA technology could be applied to the processing of silicon wafers, compact disks, optical components, solar cells, cutting tools, and fasteners.

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