Transport of negative ions produced at a barium surface located within a multicusp ion source

1989 ◽  
Vol 60 (4) ◽  
pp. 539-546 ◽  
Author(s):  
C. F. A. van Os ◽  
A. W. Kleyn ◽  
L. M. Lea ◽  
A. J. T. Holmes ◽  
P. W. van Amersfoort
Keyword(s):  
Negative Ions ◽  
Ion Source ◽  
Multicusp Ion Source

Extraction characteristics of Na and Na2 negative ions from a small multicusp ion source

1992 ◽  
Vol 63 (4) ◽  
pp. 2447-2449 ◽  
Author(s):  
H. Yamaoka ◽  
M. Wada ◽  
M. Sasao ◽  
X. M. Tong ◽  
J. Fujita
Keyword(s):  
Negative Ions ◽  
Ion Source ◽  
Multicusp Ion Source

scholarly journals Increasing the efficiency of a multicusp ion source

1982 ◽  
Vol 53 (9) ◽  
pp. 1429-1433 ◽  
Author(s):  
K. W. Ehlers ◽  
K. N. Leung
Keyword(s):  
Ion Source ◽  
Multicusp Ion Source

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

scholarly journals H−formation process in a multicusp ion source

1987 ◽  
Vol 59 (7) ◽  
pp. 787-790 ◽  
Author(s):  
K. N. Leung ◽  
W. B. Kunkel
Keyword(s):  
Formation Process ◽  
Ion Source ◽  
Multicusp Ion Source

Theoretical discussion for electron-density distribution in multicusp ion source

2011 ◽  
Vol 98 (12) ◽  
pp. 121501 ◽  
Author(s):  
Hualin Zhan ◽  
Chundong Hu ◽  
Yahong Xie ◽  
Bin Wu ◽  
Jinfang Wang ◽  
...  
Keyword(s):  
Density Distribution ◽  
Electron Density ◽  
Electron Density Distribution ◽  
Ion Source ◽  
Theoretical Discussion ◽  
Multicusp Ion Source
Sign in / Sign up

Export Citation Format

Share Document