Automated apparatus for evaporation and in situ measurements of multiple thin films

1978 ◽  
Vol 49 (1) ◽  
pp. 24-30 ◽  
Author(s):  
William H. Clark ◽  
S. John Brient ◽  
R. L. Longbrake ◽  
J. Elon Graves
2017 ◽  
Vol 983 ◽  
pp. 54-66 ◽  
Author(s):  
Amauri Antonio Menegário ◽  
Lauren N. Marques Yabuki ◽  
Karen S. Luko ◽  
Paul N. Williams ◽  
Daniel M. Blackburn

2020 ◽  
Vol 12 (32) ◽  
pp. 36417-36427
Author(s):  
Yeon-Ju Kim ◽  
Sehyun Lee ◽  
Muhammad. R. Niazi ◽  
Kyoungtae Hwang ◽  
Ming-Chun Tang ◽  
...  

1989 ◽  
Vol 162-164 ◽  
pp. 441-442 ◽  
Author(s):  
G. Garry ◽  
D. Dubreuil ◽  
Y Lemaitre ◽  
D. Dieumegard ◽  
J. Siejka ◽  
...  

2012 ◽  
Vol 1426 ◽  
pp. 307-311 ◽  
Author(s):  
Yeonwon Kim ◽  
Kosuke Hatozaki ◽  
Yuji Hashimoto ◽  
Hyunwoong Seo ◽  
Giichiro Uchida ◽  
...  

ABSTRACTWe have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM’s) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM’s. The results show that the higher deposition rate leads to the higher volume fraction of clusters.


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