Metalorganic chemical vapor deposition of TiO2:N anatase thin film on Si substrate

Dong Heon Lee; Yong Soo Cho; Woul In Yi; Tae Song Kim; Jeon Kook Lee; Hyung Jin Jung

doi:10.1063/1.113430

Metalorganic chemical vapor deposition of TiO2:N anatase thin film on Si substrate

Applied Physics Letters ◽

10.1063/1.113430 ◽

1995 ◽

Vol 66 (7) ◽

pp. 815-816 ◽

Cited By ~ 44

Author(s):

Dong Heon Lee ◽

Yong Soo Cho ◽

Woul In Yi ◽

Tae Song Kim ◽

Jeon Kook Lee ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrate ◽

Metalorganic Chemical

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Two-step metalorganic chemical vapor deposition growth of piezoelectric ZnO thin film on SiO2/Si substrate

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1379323 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1850-1853 ◽

Cited By ~ 29

Author(s):

S. Muthukumar ◽

N. W. Emanetoglu ◽

G. Patounakis ◽

C. R. Gorla ◽

S. Liang ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Zno Thin Film ◽

Si Substrate ◽

Chemical Vapor Deposition Growth ◽

Metalorganic Chemical

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First Room-Temperature Continuous-Wave Operation of Self-Formed InGaAs Quantum Dot-Like Laser on Si substrate Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3860 ◽

2000 ◽

Vol 39 (Part 1, No. 7A) ◽

pp. 3860-3862 ◽

Cited By ~ 9

Author(s):

Zaman Iqbal Kazi ◽

Takashi Egawa ◽

Takashi Jimbo ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Dot ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Si Substrate ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Ferroelectric SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581554 ◽

1999 ◽

Vol 17 (1) ◽

pp. 83-87 ◽

Cited By ~ 5

Author(s):

Nak-Jin Seong ◽

Eun-Suck Choi ◽

Soon-Gil Yoon

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Bottom Electrode ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Metalorganic Chemical

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Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film

Materials Science Forum ◽

10.4028/www.scientific.net/msf.140-142.457 ◽

1993 ◽

Vol 140-142 ◽

pp. 457-464

Author(s):

Kenji Ebihara ◽

Tomoaki Ikegami

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

High Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Film ◽

High Temperature Superconducting ◽

Metalorganic Chemical

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The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1287154 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2384 ◽

Cited By ~ 16

Author(s):

Si-Moo Lee ◽

Jeong-Hoon Park ◽

Kug-Sun Hong ◽

Woon-Jo Cho ◽

Dong-Lae Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Deposition Behavior ◽

Metalorganic Chemical

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Electrical Properties of SrBi2Ta2O9 (SBT) Thin Film Prepared by Metalorganic Chemical Vapor Deposition

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.181-182.93 ◽

2000 ◽

Vol 181-182 ◽

pp. 93-100

Author(s):

N. Nukaga ◽

Hiroshi Funakubo ◽

Ishikawa Kunio ◽

E. Shigeno ◽

Yutaka Sawada

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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ZnS:Mn thin-film electroluminescent devices prepared by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(96)00321-1 ◽

1996 ◽

Vol 169 (1) ◽

pp. 33-39 ◽

Cited By ~ 20

Author(s):

Hideki Kina ◽

Yoji Yamada ◽

Yukihiro Maruta ◽

Yukihisa Tamura

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Electroluminescent Devices ◽

Metalorganic Chemical

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Phase transition of PbTiO3 polycrystalline thin film prepared by metalorganic chemical vapor deposition on yttrium stabilized zirconium

Solid State Communications ◽

10.1016/0038-1098(95)00465-3 ◽

1995 ◽

Vol 96 (7) ◽

pp. 477-480 ◽

Cited By ~ 4

Author(s):

Tao Yu ◽

Yan-Feng Chen ◽

Li Shun ◽

Jian-Xie Chen ◽

Nai-Ben Ming

Keyword(s):

Thin Film ◽

Phase Transition ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Polycrystalline Thin Film ◽

Metalorganic Chemical

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Thin film channel waveguides fabricated in metalorganic chemical vapor deposition grown BaTiO3 on MgO

Applied Physics Letters ◽

10.1063/1.117746 ◽

1996 ◽

Vol 69 (20) ◽

pp. 2968-2970 ◽

Cited By ~ 67

Author(s):

D. M. Gill ◽

B. A. Block ◽

C. W. Conrad ◽

B. W. Wessels ◽

S. T. Ho

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Channel Waveguides ◽

Metalorganic Chemical

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Reduction of Stress in GaAs with In-Doped GaAs Intermediate Layer Grown on Si Substrate by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.3808 ◽

1992 ◽

Vol 31 (Part 1, No. 12A) ◽

pp. 3808-3811 ◽

Cited By ~ 2

Author(s):

Eiji Yamaichi ◽

Sachiko Onozawa ◽

Takashi Ueda ◽

Chouho Yamagishi ◽

Masahiro Akiyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Intermediate Layer ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrate ◽

Metalorganic Chemical

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