Subsurface hydrogenated amorphous silicon to μc‐hydrogenated silicon transformation during magnetron sputter deposition determined by spectroscopic ellipsometry

1994 ◽  
Vol 65 (14) ◽  
pp. 1769-1771 ◽  
Author(s):  
Y. H. Yang ◽  
M. Katiyar ◽  
G. F. Feng ◽  
N. Maley ◽  
J. R. Abelson
Keyword(s):  
Amorphous Silicon ◽  
Spectroscopic Ellipsometry ◽  
Hydrogenated Amorphous Silicon ◽  
Sputter Deposition ◽  
Hydrogenated Silicon ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Hydrogenated Amorphous

Spectroscopic Ellipsometry Characterization of Hydrogenated Amorphous Silicon Thin Film

2013 ◽  
Vol 33 (10) ◽  
pp. 1031001
Author(s):  
何剑 He Jian ◽  
李伟 Li Wei ◽  
徐睿 Xu Rui ◽  
郭安然 Guo Anran ◽  
祁康成 Qi Kangcheng ◽  
...  
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Spectroscopic Ellipsometry ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Thin Film ◽  
Hydrogenated Amorphous

R.F. reactive sputter deposition of hydrogenated amorphous silicon carbide films

1986 ◽  
Vol 139 (3) ◽  
pp. 275-285 ◽  
Author(s):  
B. Goranchev ◽  
K. Reichelt ◽  
J. Chevallier ◽  
P. Hornshoj ◽  
H. Dimigen ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Sputter Deposition ◽  
Amorphous Silicon Carbide ◽  
Reactive Sputter Deposition ◽  
Hydrogenated Amorphous
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