Real‐time investigations of GaAs surface cleaning with a hydrogen electron cyclotron resonance plasma by optical reflection spectroscopy

1994 ◽  
Vol 65 (24) ◽  
pp. 3117-3119 ◽  
Author(s):  
L. M. Weegels ◽  
T. Saitoh ◽  
H. Kanbe
Keyword(s):  
Real Time ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Surface Cleaning ◽  
Electron Cyclotron ◽  
Gaas Surface ◽  
Reflection Spectroscopy ◽  
Electron Cyclotron Resonance Plasma ◽  
Optical Reflection ◽  
Resonance Plasma

Surface cleaning of C‐dopedp+GaAs with hydrogen electron cyclotron resonance plasma

1993 ◽  
Vol 73 (12) ◽  
pp. 8146-8150 ◽  
Author(s):  
Noriyuki Watanabe ◽  
Takumi Nittono ◽  
Hiroshi Ito ◽  
Naoto Kondo ◽  
Yasushi Nanishi
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Surface Cleaning ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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