Deposition of fluoropolymer thin films by vacuum‐ultraviolet laser ablation

1994 ◽  
Vol 65 (11) ◽  
pp. 1370-1372 ◽  
Author(s):  
Y. Ueno ◽  
T. Fujii ◽  
F. Kannari
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

scholarly journals Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation.

1994 ◽  
Vol 7 (2) ◽  
pp. 373-380 ◽  
Author(s):  
SHINGO INOUE ◽  
TAKEO FUJII ◽  
YOSHIAKI UENO ◽  
FUMIHITKO KANNARI
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Vacuum Ultraviolet Laser Ablation of Teflon (PTFE)

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore
Keyword(s):  
Experimental Data ◽  
Laser Ablation ◽  
Computer Model ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Swelling Characteristics ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm ◽  
Fluence Range

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.

Micro Ablation of Optical Fibers Using Vacuum Ultraviolet Laser

2007 ◽  
Author(s):  
Yutang Dai ◽  
Weilai Li ◽  
Desheng Jiang
Keyword(s):  
Laser Ablation ◽  
Optical Fibers ◽  
Vacuum Ultraviolet ◽  
Ablation Rate ◽  
Photon Absorption ◽  
Ultraviolet Laser ◽  
Silica Glasses ◽  
Vacuum Ultraviolet Laser ◽  
Laser Experiments ◽  
Micro Structures

157nm vacuum ultraviolet laser was considered as one of promising tools for next-generation lithography or precision micro-ablation. In this study, a multi-functional micro-ablation system with 157 nm vacuum ultraviolet laser was conducted. Some laser ablation experiments were performed for silica glasses and optical fibers. For the silica glasses, the average ablation rate of the 157nm laser could reach to 4μm/s. The material removal is one-photon-absorption process in the case of 157nm VUV laser. Experiments also show that, the 157nm laser ablation has wonderful possibilities for fabricating precision 3D micro-structures in the optical fibers.

Subpicosecond vacuum ultraviolet laser system for advanced materials processing

2007 ◽  
Author(s):  
Shoichi Kubodera ◽  
Yuta Taniguchi ◽  
Akira Hosotani ◽  
Masahito Katto ◽  
Atsushi Yokotani ◽  
...  
Keyword(s):  
Vacuum Ultraviolet ◽  
Laser System ◽  
Advanced Materials ◽  
Materials Processing ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Micro-pulling down method-grown Er3+:LiCaAlF6 as prospective vacuum ultraviolet laser material

2013 ◽  
Vol 362 ◽  
pp. 167-169 ◽  
Author(s):  
Marilou Cadatal-Raduban ◽  
Toshihiko Shimizu ◽  
Kohei Yamanoi ◽  
Kohei Takeda ◽  
Minh Hong Pham ◽  
...  
Keyword(s):  
Vacuum Ultraviolet ◽  
Laser Material ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Analysis of Xanthate Derivatives by Vacuum Ultraviolet Laser-Time-of-Flight Mass Spectrometry

1998 ◽  
Vol 70 (21) ◽  
pp. 4534-4539 ◽  
Author(s):  
Y. J. Shi ◽  
X. K. Hu ◽  
D. M. Mao ◽  
S. S. Dimov ◽  
R. H. Lipson
Keyword(s):  
Mass Spectrometry ◽  
Vacuum Ultraviolet ◽  
Time Of Flight ◽  
Ultraviolet Laser ◽  
Flight Mass Spectrometry ◽  
Vacuum Ultraviolet Laser
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