Hydrostatic pressure effects on the optical transitions in the free‐standing porous silicon film

1993 ◽  
Vol 63 (3) ◽  
pp. 346-348 ◽  
Author(s):  
Norio Ookubo ◽  
Yasuhiro Matsuda ◽  
Noritaka Kuroda
2010 ◽  
Vol 245 ◽  
pp. 012012 ◽  
Author(s):  
G Galindez-Ramirez ◽  
S T Perez-Merchancano ◽  
H Paredes Gutierrez ◽  
J D González

2017 ◽  
Vol 13 (6) ◽  
Author(s):  
Mohamed El-Yadri ◽  
Noredine Aghoutane ◽  
Asmae El Aouami ◽  
El Mustapha Feddi ◽  
Mimoum Zazoui ◽  
...  

2007 ◽  
Vol 7 (11) ◽  
pp. 4165-4168
Author(s):  
Jihoon Kim ◽  
Youngdae Koh ◽  
Seunghyun Jang ◽  
Young Chun Ko ◽  
Hee-Gweon Woo ◽  
...  

Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 °C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.


1995 ◽  
Vol 56 (3-4) ◽  
pp. 655-661 ◽  
Author(s):  
J. Zeman ◽  
M. Zigone ◽  
G.L.J.A. Rikken ◽  
G. Martinez

1995 ◽  
Vol 96 (7) ◽  
pp. 503-506 ◽  
Author(s):  
J. Zeman ◽  
M. Zigone ◽  
G.L.J.A. Rikken ◽  
G. Martinez

2007 ◽  
Vol 7 (11) ◽  
pp. 4165-4168 ◽  
Author(s):  
Jihoon Kim ◽  
Youngdae Koh ◽  
Seunghyun Jang ◽  
Young Chun Ko ◽  
Hee-Gweon Woo ◽  
...  

Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 °C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.


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