Photonic Polymer Replicas from Distributed Bragg Reflectors Structured Porous Silicon

Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 °C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.