Epoxy‐amine polymer waveguide containing nonlinear optical molecules fabricated by chemical vapor deposition

1992 ◽  
Vol 60 (10) ◽  
pp. 1158-1160 ◽  
Author(s):  
Satoshi Tatsuura ◽  
Wataru Sotoyama ◽  
Tetsuzo Yoshimura
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Nonlinear Optical ◽  
Chemical Vapor ◽  
Polymer Waveguide ◽  
Epoxy Amine

Nonlinear optical properties of silicon nanocrystals grown by plasma-enhanced chemical vapor deposition

2002 ◽  
Vol 91 (7) ◽  
pp. 4607-4610 ◽  
Author(s):  
G. Vijaya Prakash ◽  
M. Cazzanelli ◽  
Z. Gaburro ◽  
L. Pavesi ◽  
F. Iacona ◽  
...  
Keyword(s):  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Nanocrystals ◽  
Nonlinear Optical ◽  
Chemical Vapor ◽  
Nonlinear Optical Properties

Nonlinear Optical Properties of Si Nanocrystals

2006 ◽  
Vol 958 ◽  
Author(s):  
Rita Spano ◽  
Massimo Cazzanelli ◽  
Nicola Daldosso ◽  
Zeno Gaburro ◽  
Luigi Ferraioli ◽  
...  
Keyword(s):  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Nanocrystals ◽  
Nonlinear Optical ◽  
Chemical Vapor ◽  
Nonlinear Optical Properties ◽  
Si Nanocrystals ◽  
Optical Refraction ◽  
Laser Sources

ABSTRACTA systematic study of nonlinear optical properties of silicon nanocrystals (Si-nc) grown by plasma enhanced chemical vapor deposition (PECVD) is reported. Nonlinear optical refraction and absorption have been measured by z-scan technique at three different time regimes and at different wavelengths to investigate both the thermal and electronic responses. For this purpose three different laser sources have been used. Different behaviors, as expected from the theory, for different pump pulse durations are observed.

Deposition of Potassium Niobate Thin Films by Metalorganic Chemical Vapor Deposition and their Nonlinear Optical Properties

1995 ◽  
Vol 392 ◽  
Author(s):  
M. J. Nystrom ◽  
B. W. Wessels ◽  
J. Chen ◽  
D. Studebaker ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Nonlinear Optical ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Nonlinear Optical Properties ◽  
Potassium Niobate ◽  
Metalorganic Chemical

AbstractFerroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

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