Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate

Toshiro Maruyama; Susumu Arai

doi:10.1063/1.106699

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate

Applied Physics Letters ◽

10.1063/1.106699 ◽

1992 ◽

Vol 60 (3) ◽

pp. 322-323 ◽

Cited By ~ 96

Author(s):

Toshiro Maruyama ◽

Susumu Arai

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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ChemInform Abstract: CHEMICAL VAPOR DEPOSITION OF ALUMINUM OXIDE THIN FILMS UNDER REDUCED PRESSURES

Chemischer Informationsdienst ◽

10.1002/chin.198530397 ◽

1985 ◽

Vol 16 (30) ◽

Author(s):

J. SARAIE ◽

J. KWON ◽

Y. YODOGAWA

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Reduced Pressures

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Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3294718 ◽

2010 ◽

Vol 28 (2) ◽

pp. 238-243 ◽

Cited By ~ 2

Author(s):

Benjamin W. Schmidt ◽

William J. Sweet ◽

Eric J. Bierschenk ◽

Cameron K. Gren ◽

Timothy P. Hanusa ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.076 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 8991-8997 ◽

Cited By ~ 28

Author(s):

Scott F. Szymanski ◽

Michael T. Seman ◽

Colin A. Wolden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Oxide Thin Films ◽

Phase Characterization

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A study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxide

Journal of Electronic Materials ◽

10.1007/bf02652101 ◽

1988 ◽

Vol 17 (6) ◽

pp. 509-517 ◽

Cited By ~ 17

Author(s):

Kenneth Michael Gustin ◽

Roy Gerald Gordon

Keyword(s):

Thin Films ◽

Nitrous Oxide ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical

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Chemical Vapor Deposition of Aluminum Oxide Thin Films

Journal of Chemical Education ◽

10.1021/ed100391p ◽

2010 ◽

Vol 87 (10) ◽

pp. 1102-1104 ◽

Cited By ~ 9

Author(s):

Jason K. Vohs ◽

Amy Bentz ◽

Krystal Eleamos ◽

John Poole ◽

Bradley D. Fahlman

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2891258 ◽

2008 ◽

Vol 26 (4) ◽

pp. 1079-1084 ◽

Cited By ~ 24

Author(s):

Scott F. Szymanski ◽

Pieter Rowlette ◽

Colin A. Wolden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Oxide Thin Films

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Fabrication of Aluminum Oxide Thin Films by Solution-Source Non-Vacuum Process of Mist Chemical Vapor Deposition with Ozone Assistance

10.7567/ssdm.2013.p-3-2 ◽

2013 ◽

Author(s):

T. Uchida ◽

T. Kawaharamura ◽

M. Furuta ◽

S. Fujita

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Solution Source

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Synthesis of aluminum oxide thin films: Use of aluminum tris‐dipivaloylmethanate as a new low pressure metal organic chemical vapor deposition precursor

Applied Physics Letters ◽

10.1063/1.114960 ◽

1995 ◽

Vol 67 (11) ◽

pp. 1624-1626 ◽

Cited By ~ 24

Author(s):

E. Ciliberto ◽

I. Fragalà ◽

R. Rizza ◽

G. Spoto ◽

G. C. Allen

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Remote Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Aluminum Oxide Thin Films

Plasma Processes and Polymers ◽

10.1002/ppap.200700164 ◽

2008 ◽

Vol 5 (7) ◽

pp. 645-652 ◽

Cited By ~ 7

Author(s):

Ioana Volintiru ◽

Mariadriana Creatore ◽

Johannes L. van Hemmen ◽

Mauritius C. M. van de Sanden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Remote Plasma ◽

Metalorganic Chemical

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Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2007.05.064 ◽

2008 ◽

Vol 516 (6) ◽

pp. 1290-1296 ◽

Cited By ~ 69

Author(s):

C. Cibert ◽

H. Hidalgo ◽

C. Champeaux ◽

P. Tristant ◽

C. Tixier ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Pulsed Laser Deposition ◽

Vapor Deposition ◽

Pulsed Laser ◽

Chemical Vapor ◽

Laser Deposition ◽

Oxide Thin Films

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