Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

2008 ◽  
Vol 26 (4) ◽  
pp. 1079-1084 ◽  
Author(s):  
Scott F. Szymanski ◽  
Pieter Rowlette ◽  
Colin A. Wolden
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Pulsed Plasma ◽  
Oxide Thin Films

Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

2007 ◽  
Vol 90 (13) ◽  
pp. 131504 ◽  
Author(s):  
Michael Seman ◽  
Joshua J. Robbins ◽  
Sumit Agarwal ◽  
Colin A. Wolden
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Chemical Vapor ◽  
Pulsed Plasma ◽  
Oxide Thin Films

Chemical Vapor Deposition of Aluminum Oxide Thin Films

2010 ◽  
Vol 87 (10) ◽  
pp. 1102-1104 ◽  
Author(s):  
Jason K. Vohs ◽  
Amy Bentz ◽  
Krystal Eleamos ◽  
John Poole ◽  
Bradley D. Fahlman
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Films

Remote Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Aluminum Oxide Thin Films

2008 ◽  
Vol 5 (7) ◽  
pp. 645-652 ◽  
Author(s):  
Ioana Volintiru ◽  
Mariadriana Creatore ◽  
Johannes L. van Hemmen ◽  
Mauritius C. M. van de Sanden
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
Metalorganic Chemical
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