Non‐contact electrical characterization of low‐resistivity p‐type ZnSe:N grown by molecular beam epitaxy

1991 ◽  
Vol 59 (15) ◽  
pp. 1896-1898 ◽  
Author(s):  
R. M. Park ◽  
M. B. Troffer ◽  
E. Yablonovitch ◽  
T. J. Gmitter
1998 ◽  
Vol 72 (23) ◽  
pp. 3026-3028 ◽  
Author(s):  
D. Seghier ◽  
I. S. Hauksson ◽  
H. P. Gislason ◽  
G. D. Brownlie ◽  
K. A. Prior ◽  
...  

1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


1996 ◽  
Vol 159 (1-4) ◽  
pp. 257-260 ◽  
Author(s):  
M. Imaizumi ◽  
H. Kuroki ◽  
Y. Endoh ◽  
M. Suita ◽  
K. Ohtsuka ◽  
...  

2013 ◽  
Vol 103 (9) ◽  
pp. 092103 ◽  
Author(s):  
Vl. Kolkovsky ◽  
Z. R. Zytkiewicz ◽  
M. Sobanska ◽  
K. Klosek

1989 ◽  
Vol 66 (9) ◽  
pp. 4295-4300 ◽  
Author(s):  
S. M. Shibli ◽  
M. C. Tamargo ◽  
J. L. De Miguel ◽  
B. J. Skromme ◽  
R. E. Nahory ◽  
...  

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