AlInGaAs/AlGaAs separate‐confinement heterostructure strained single quantum well diode lasers grown by organometallic vapor phase epitaxy

1991 ◽  
Vol 58 (20) ◽  
pp. 2208-2210 ◽  
Author(s):  
C. A. Wang ◽  
J. N. Walpole ◽  
L. J. Missaggia ◽  
J. P. Donnelly ◽  
H. K. Choi
1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1961-1965 ◽  
Author(s):  
Akihiko Ishibashi ◽  
Hidemi Takeishi ◽  
Nobuyuki Uemura ◽  
Masahiro Kume ◽  
Yasufumi Yabuuchi ◽  
...  

2002 ◽  
Vol 41 (Part 1, No. 2B) ◽  
pp. 1040-1042 ◽  
Author(s):  
Glenn-Yves Plaine ◽  
Carl Asplund ◽  
Petrus Sundgren ◽  
Sebastian Mogg ◽  
Mattias Hammar

1992 ◽  
Author(s):  
Raymond J. Menna ◽  
David R. Capewell ◽  
Ramon U. Martinelli ◽  
Pamela K. York ◽  
Ronald E. Enstrom

1990 ◽  
Vol 01 (03n04) ◽  
pp. 347-367 ◽  
Author(s):  
KAZUHITO FURUYA ◽  
YASUYUKI MIYAMOTO

GaInAsP/InP organometallic vapor phase epitaxy (OMVPE) is widely used for the fabrication of lasers and detectors used in optical communication. Here we describe the apparatus and growth technique of OMVPE and point out important growth conditions to obtain device quality single-crystal materials. Our research includes the use of OMVPE for the study of quantum-well lasers, ballistic-transport electron devices and nanometer heterostructures.


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