Misfit dislocation dynamics in Si1−xGex/(100) Si: Uncapped alloy layers, buried strained layers, and multiple quantum wells

1990 ◽  
Vol 57 (14) ◽  
pp. 1434-1436 ◽  
Author(s):  
D. C. Houghton
Keyword(s):  
Quantum Wells ◽  
Misfit Dislocation ◽  
Dislocation Dynamics ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Strained Layers

Rapid Thermal Processing of Buried Sil−xGex Strained Layers; Photoluminescence Decay and Misfit Dislocation Generation.

1990 ◽  
Vol 198 ◽  
Author(s):  
D.C. Houghton ◽  
N.L. Rowell
Keyword(s):  
Quantum Wells ◽  
Misfit Dislocation ◽  
Thermal Processing ◽  
Internal Quantum Efficiency ◽  
Dislocation Nucleation ◽  
Multiple Quantum ◽  
Misfit Dislocations ◽  
Dislocation Generation ◽  
Strained Layers ◽  
Wide Range

ABSTRACTThe thermal constraints for device processing imposed by strain relaxation have been determined for a wide range of Si-Ge strained heterostructures. Misfit dislocation densities and glide velocities in uncapped Sil-xGex alloy layers, Sil-xGex single and multiple quantum wells have been measured using defect etching and TEM for a range of anneal temperatures (450°C-1000°C) and anneal times (5s-2000s). The decay of an intense photoluminescence peak (∼ 10% internal quantum efficiency ) from buried Si1-xGex strained layers has been correlated with the generation of misfit dislocations in adjacent Sil-xGex /Si interfaces. The misfit dislocation nucleation rate and glide velocity for all geometries and alloy compositions (0<x<0.25) were found to be thermally activated processes with activation energies of (2.5±0.2)eV and (2.3-0.65x)eV, respectively. The time-temperature regime available for thermal processing is mapped out as a function of dislocation density using a new kinetic model.

Photoluminescence from Coherently Strained Si1−xGex Alloys

1990 ◽  
Vol 198 ◽  
Author(s):  
N.L. Rowell ◽  
J.-P. Noël ◽  
D.C. Houghton ◽  
D.D. Perovic
Keyword(s):  
Quantum Wells ◽  
Internal Quantum Efficiency ◽  
High Energy ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Misfit Dislocations ◽  
Strained Si ◽  
Strained Layers ◽  
Defect Complexes ◽  
Random Alloy

ABSTRACTAn intense, broad photoluminescence PL peak, with an internal quantum efficiency as high as 31%, has been observed from a variety of structures containing Si1−xGex strained layers on Si(100) substrates; i.e. Si1−xGex thick random alloy layers, single quantum wells (SQW) and multiple quantum wells (MQW) with layers thick enough so that zone folding effects were not relevant. This peak, which shifted consistently and predictably with Ge concentration( 0.06 < × < 0.53), had its high energy edge near the established band gap for strained SiGe. PL excitation spectroscopy indicated that no phonons were involved in the process causing the SiGe PL peak. Samples deposited at ~ 400 °C exhibited low PL intensity, whereas annealing at ~ 600 °C enhanced the intensity by as much as two orders of magnitude. This anneal treatment was found to remove grown-in defect complexes without creating a significant density of misfit dislocations. The PL peak energy at 4.2 K varied from 620 to 990 meV for Ge fractions x from 0.53 to 0.06. When the samples were forced to relax, e.g. by higher temperature annealing, the luminescence of this peak either shifted to near the relaxed bandgap or was quenched by deep, dislocation related states. Prior to such relaxation, the efficient PL was due to exciton accumulation in the strained Si1−xGex layers of single and multiple quantum wells, where the bandgap was locally reduced. It is suggested that the recombination of electrons and holes occuring within a high-density electron hole condensate (EHC) can cause the observed spectrum.

FEMTOSECOND SPECTRAL HOLE-BURNING IN GaAs/AlGaAs MULTIPLE QUANTUM WELLS

1987 ◽  
Vol 48 (C5) ◽  
pp. C5-511-C5-515 ◽  
Author(s):  
J. L. OUDAR ◽  
J. DUBARD ◽  
F. ALEXANDRE ◽  
D. HULIN ◽  
A. MIGUS ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Multiple Quantum Wells ◽  
Hole Burning ◽  
Spectral Hole Burning ◽  
Multiple Quantum ◽  
Spectral Hole

FAR INFRARED MAGNETO-ABSORPTION STUDY OF BARRIER IMPURITIES AND SCREENING IN GaAs/AlGaAs MULTIPLE QUANTUM WELLS

1987 ◽  
Vol 48 (C5) ◽  
pp. C5-239-C5-242 ◽  
Author(s):  
E. GLASER ◽  
B. V. SHANABROOK ◽  
R. J. WAGNER ◽  
R. L. HAWKINS ◽  
W. J. MOORE ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Far Infrared ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Absorption Study

Fabrication and luminescent properties of core-shell InGaN/GaN multiple quantum wells on GaN nanopillars

2012 ◽  
Vol 100 (26) ◽  
pp. 261103 ◽  
Author(s):  
J.-R. Chang ◽  
S.-P. Chang ◽  
Y.-J. Li ◽  
Y.-J. Cheng ◽  
K.-P. Sou ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Luminescent Properties ◽  
Multiple Quantum Wells ◽  
Core Shell ◽  
Multiple Quantum

Atomic scale characterization of GaInN/GaN multiple quantum wells in V-shaped pits

2011 ◽  
Vol 98 (18) ◽  
pp. 181904 ◽  
Author(s):  
Shigetaka Tomiya ◽  
Yuya Kanitani ◽  
Shinji Tanaka ◽  
Tadakatsu Ohkubo ◽  
Kazuhiro Hono
Keyword(s):  
Quantum Wells ◽  
Atomic Scale ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Scale Characterization

Novel Dual Wavelength Electro-Optical Bistability in InGaAs/AlGaAs Multiple Quantum Wells

1992 ◽  
Vol 31 (Part 2, No. 3B) ◽  
pp. L313-L315 ◽  
Author(s):  
Stephen Giugni ◽  
Kenji Kawashima ◽  
Kenzo Fujiwara ◽  
Naokatsu Sano
Keyword(s):  
Quantum Wells ◽  
Optical Bistability ◽  
Dual Wavelength ◽  
Multiple Quantum Wells ◽  
Multiple Quantum
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