Variation of the spacer layer between two resonant tunneling diodes

1989 ◽  
Vol 55 (18) ◽  
pp. 1871-1873 ◽  
Author(s):  
E. Wolak ◽  
B. G. Park ◽  
K. L. Lear ◽  
J. S. Harris
1996 ◽  
Vol 227 (1-4) ◽  
pp. 210-212 ◽  
Author(s):  
Y.C. Kang ◽  
M. Suhara ◽  
K. Furuya ◽  
M. Gault ◽  
R. Takemura

2000 ◽  
Vol 631 ◽  
Author(s):  
J. G. Fleming ◽  
E. Chow ◽  
S.-Y. Lin

ABSTRACTResonance Tunneling Diodes (RTDs) are devices that can demonstrate very highspeed operation. Typically they have been fabricated using epitaxial techniques and materials not consistent with standard commercial integrated circuits. We report here the first demonstration of SiO2-Si-SiO2 RTDs. These new structures were fabricated using novel combinations of silicon integrated circuit processes.


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