Influence of pulse width on ultraviolet laser ablation of poly(methyl methacrylate)

1988 ◽  
Vol 53 (14) ◽  
pp. 1233-1235 ◽  
Author(s):  
R. Srinivasan ◽  
Bodil Braren
1988 ◽  
Vol 129 ◽  
Author(s):  
Bodil Braren ◽  
R. Srinivasan

ABSTRACTThe dependance on the pulse width of the ultraviolet laser ablation and etching of poly(methyl methacrylate) was examined using 40-100 ns pulses. These pulses were created by stitching together two identical pulses, each of 40 ns half-width, which were separated by a set time interval from 0 to 380 ns. The etch depth/pulse is sensitive to the pulse width and, therefore, the power density in this polymer.The response of PMMA to etching by pairs of pulses suggests that short-lived species which may be electronic states (e.g., triplets) and/or radicals play an important role in the ablation. The shape of the pulse was also found to influence the etch depth/pulse.The etching of polyimide by these extended pulses shows trends that are opposite to those observed in poly(methyl methacrylate). In this instance the shielding of the latter portion of the incoming pulse by the products that are ablated by the front portion is probably a serious effect.


2007 ◽  
Vol 111 (32) ◽  
pp. 12024-12030 ◽  
Author(s):  
Patrick F. Conforti ◽  
Manish Prasad ◽  
Barbara J. Garrison

2007 ◽  
Vol 253 (15) ◽  
pp. 6442-6446 ◽  
Author(s):  
S. Gaspard ◽  
M. Oujja ◽  
E. Rebollar ◽  
M. Walczak ◽  
L. Díaz ◽  
...  

1995 ◽  
Vol 99 (29) ◽  
pp. 11481-11488 ◽  
Author(s):  
Hisashi Fujiwara ◽  
Yoshinori Nakajima ◽  
Hiroshi Fukumura ◽  
Hiroshi Masuhara

2015 ◽  
Vol 357 ◽  
pp. 273-281 ◽  
Author(s):  
F. Baset ◽  
K. Popov ◽  
A. Villafranca ◽  
A.M. Alshehri ◽  
J.-M. Guay ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document