Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nm

1986 ◽  
Vol 19 (3) ◽  
pp. 916-921 ◽  
Author(s):  
R. Srinivasan ◽  
B. Braren ◽  
D. E. Seeger ◽  
R. W. Dreyfus
Keyword(s):  
Laser Ablation ◽  
Methyl Methacrylate ◽  
Ultraviolet Laser ◽  
Poly Methyl Methacrylate ◽  
Polymeric Solid ◽  
193 Nm ◽  
Photochemical Cleavage

Ablation of Polymers with Pairs of Ultraviolet Laser Pulses with Controlled Temporal Separation

1988 ◽  
Vol 129 ◽  
Author(s):  
Bodil Braren ◽  
R. Srinivasan
Keyword(s):  
Laser Ablation ◽  
Methyl Methacrylate ◽  
Pulse Width ◽  
Electronic States ◽  
Laser Pulses ◽  
Etch Depth ◽  
Time Interval ◽  
Temporal Separation ◽  
Ultraviolet Laser ◽  
Poly Methyl Methacrylate

ABSTRACTThe dependance on the pulse width of the ultraviolet laser ablation and etching of poly(methyl methacrylate) was examined using 40-100 ns pulses. These pulses were created by stitching together two identical pulses, each of 40 ns half-width, which were separated by a set time interval from 0 to 380 ns. The etch depth/pulse is sensitive to the pulse width and, therefore, the power density in this polymer.The response of PMMA to etching by pairs of pulses suggests that short-lived species which may be electronic states (e.g., triplets) and/or radicals play an important role in the ablation. The shape of the pulse was also found to influence the etch depth/pulse.The etching of polyimide by these extended pulses shows trends that are opposite to those observed in poly(methyl methacrylate). In this instance the shielding of the latter portion of the incoming pulse by the products that are ablated by the front portion is probably a serious effect.

Simulations of Laser Ablation of Poly(methyl methacrylate):  Fluence versus Number of Photons

2007 ◽  
Vol 111 (32) ◽  
pp. 12024-12030 ◽  
Author(s):  
Patrick F. Conforti ◽  
Manish Prasad ◽  
Barbara J. Garrison
Keyword(s):  
Laser Ablation ◽  
Methyl Methacrylate ◽  
Poly Methyl Methacrylate

Vacuum Ultraviolet Laser Ablation of Teflon (PTFE)

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore
Keyword(s):  
Experimental Data ◽  
Laser Ablation ◽  
Computer Model ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Swelling Characteristics ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm ◽  
Fluence Range

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.

Ablation of poly(methyl methacrylate) and poly(2-hydroxyethyl methacrylate) by 308, 222 and 193 nm excimer-laser radiation

1995 ◽  
Vol 60 (3) ◽  
pp. 261-270 ◽  
Author(s):  
A. Costela ◽  
J. M. Figuera ◽  
F. Florido ◽  
I. Garc�a-Moreno ◽  
E. P. Collar ◽  
...  
Keyword(s):  
Laser Radiation ◽  
Methyl Methacrylate ◽  
Excimer Laser ◽  
Hydroxyethyl Methacrylate ◽  
Poly Methyl Methacrylate ◽  
Excimer Laser Radiation ◽  
193 Nm

IR laser ablation of doped poly(methyl methacrylate)

2007 ◽  
Vol 253 (15) ◽  
pp. 6442-6446 ◽  
Author(s):  
S. Gaspard ◽  
M. Oujja ◽  
E. Rebollar ◽  
M. Walczak ◽  
L. Díaz ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Methyl Methacrylate ◽  
Poly Methyl Methacrylate ◽  
Ir Laser
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