FUNDAMENTALS OF THE PLASMA INDUCED AND ASSISTED CVD : PLASMA PARAMETERS CONTROLLING THE CHEMICAL EQUILIBRIUM, THE DEPOSITION KINETICS AND THE PROPERTIES OF THE FILMS
1989 ◽
Vol 50
(C5)
◽
pp. C5-617-C5-635
Keyword(s):
1985 ◽
Vol 10
(6)
◽
pp. 883-891
◽
2003 ◽
Vol 9
(4)
◽
pp. 73-78
◽
2006 ◽
Vol 12
(4)
◽
pp. 56-70
◽
2020 ◽
Vol 14
(3)
◽
pp. 513-523