Preparation of γ‐alumina/silica core–shell abrasives and their chemical mechanical polishing performances on sapphire substrates

Xin Wang; Hong Lei

doi:10.1049/mnl.2018.0166

Preparation of γ‐alumina/silica core–shell abrasives and their chemical mechanical polishing performances on sapphire substrates

Micro & Nano Letters ◽

10.1049/mnl.2018.0166 ◽

2018 ◽

Vol 13 (9) ◽

pp. 1315-1320 ◽

Cited By ~ 2

Author(s):

Xin Wang ◽

Hong Lei

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Core Shell ◽

Sapphire Substrates ◽

Silica Core

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Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper

Applied Surface Science ◽

10.1016/j.apsusc.2011.09.074 ◽

2011 ◽

Vol 258 (3) ◽

pp. 1217-1224 ◽

Cited By ~ 43

Author(s):

Lei Zhang ◽

Haibo Wang ◽

Zefang Zhang ◽

Fei Qin ◽

Weili Liu ◽

...

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Core Shell ◽

Nano Composite ◽

Monodisperse Polystyrene ◽

Silica Core ◽

Controllable Size

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Preparation of non-spherical silica composite abrasives by lanthanum ion-induced effect and its chemical–mechanical polishing properties on sapphire substrates

Journal of Materials Science ◽

10.1007/s10853-018-2357-6 ◽

2018 ◽

Vol 53 (15) ◽

pp. 10732-10742 ◽

Cited By ~ 11

Author(s):

Yue Dong ◽

Hong Lei ◽

Wenqing Liu ◽

Tianxian Wang ◽

Lei Xu

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates ◽

Silica Composite ◽

Spherical Silica ◽

Lanthanum Ion

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Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates

Journal of Electronic Materials ◽

10.1007/s11664-019-07248-w ◽

2019 ◽

Vol 48 (7) ◽

pp. 4598-4606 ◽

Cited By ~ 1

Author(s):

Yue Dong ◽

Hong Lei ◽

Yi Chen ◽

Wenqing Liu ◽

Lei Xu ◽

...

Keyword(s):

Silica Nanoparticles ◽

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates ◽

Polymer Templating

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Novel polystyrene/CeO2-TiO2 multicomponent core/shell abrasives for high-efficiency and high-quality photocatalytic-assisted chemical mechanical polishing of reaction-bonded silicon carbide

Applied Surface Science ◽

10.1016/j.apsusc.2019.04.037 ◽

2019 ◽

Vol 484 ◽

pp. 534-541 ◽

Cited By ~ 11

Author(s):

Bo Gao ◽

Wenjie Zhai ◽

Quan Zhai ◽

Mingzhuang Zhang

Keyword(s):

Silicon Carbide ◽

Chemical Mechanical Polishing ◽

High Efficiency ◽

Mechanical Polishing ◽

Core Shell ◽

High Quality

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An Overview of Recent Advances in Chemical Mechanical Polishing (CMP) of Sapphire Substrates

ECS Transactions ◽

10.1149/05201.0495ecst ◽

2013 ◽

Vol 52 (1) ◽

pp. 495-500 ◽

Cited By ~ 11

Author(s):

Y.-n. Zhang ◽

B. Lin ◽

Z. C. Li

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates ◽

Recent Advances

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Chemical-mechanical polishing performance of core-shell structured polystyrene@ceria/nanodiamond ternary abrasives on sapphire wafer

Ceramics International ◽

10.1016/j.ceramint.2021.08.048 ◽

2021 ◽

Author(s):

Chen Zhou ◽

Xiangyang Xu ◽

Lei Dai ◽

Haiming Gong ◽

Shuntian Lin

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Core Shell ◽

Sapphire Wafer

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Chemical Mechanical Polishing for SiO2 Film Using Polystyrene@ceria (PS@CeO2) Core–Shell Nanocomposites

Journal of Inorganic and Organometallic Polymers and Materials ◽

10.1007/s10904-015-0253-y ◽

2015 ◽

Vol 25 (6) ◽

pp. 1407-1413 ◽

Cited By ~ 8

Author(s):

Ailian Chen ◽

Yayun Wang ◽

Jiawei Qin ◽

Zefeng Li

Keyword(s):

Chemical Mechanical Polishing ◽

Sio2 Film ◽

Mechanical Polishing ◽

Core Shell

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Stress Analysis in GaN Epilayer after Chemical Mechanical Polishing (CMP) from Sapphire Substrates

10.7567/ssdm.2009.p-6-10 ◽

2009 ◽

Author(s):

Y. K. Su ◽

C. C. Kao ◽

C. L. Lin ◽

J. J. Chen

Keyword(s):

Stress Analysis ◽

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates

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Preparation of irregular silica nano‐abrasives for the chemical mechanical polishing behaviour on sapphire substrates

Micro & Nano Letters ◽

10.1049/mnl.2019.0277 ◽

2019 ◽

Vol 14 (13) ◽

pp. 1328-1333 ◽

Cited By ~ 1

Author(s):

Yue Dong ◽

Hong Lei ◽

Wenqing Liu

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates

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Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2015.12.026 ◽

2016 ◽

Vol 172 ◽

pp. 26-31 ◽

Cited By ~ 19

Author(s):

Hong Lei ◽

Kaiyu Tong ◽

Zhanyong Wang

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Sapphire Substrates

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