Modifying the current/voltage characteristics of ion beam synthesised CoSi2/Si Schottky barrier diodes by phosphorus and arsenic implantation

1992 ◽  
Vol 28 (5) ◽  
pp. 515 ◽  
Author(s):  
R.S. Spraggs ◽  
K.J. Reeson ◽  
B.J. Sealy ◽  
G. Pananakakis ◽  
D. Bauza
1992 ◽  
Vol 28 (3) ◽  
pp. 296 ◽  
Author(s):  
R.S. Spraggs ◽  
G. Pananakakis ◽  
D. Bauza ◽  
K.J. Reeson ◽  
B.J. Sealy

2009 ◽  
Vol 615-617 ◽  
pp. 963-966 ◽  
Author(s):  
Taku Horii ◽  
Tomihito Miyazaki ◽  
Yu Saito ◽  
Shin Hashimoto ◽  
Tatsuya Tanabe ◽  
...  

Gallium nitride (GaN) vertical Schottky barrier diodes (SBDs) with a SiNx field plate (FP) structure on low-dislocation-density GaN substrates have been designed and fabricated. We have successfully achieved the SBD breakdown voltage (Vb) of 680V with the FP structure, in contrast to that of 400V without the FP structure. There was no difference in the forward current-voltage characteristics with a specific on-resistance (Ron) of 1.1mcm2. The figure of merit V2b/Ron of the SBD with the FP structure was 420MWcm-2. The FP structure and the high quality drift layers grown on the GaN substrates with low dislocation densities have greatly contributed to the obtained results.


1997 ◽  
Vol 41 (5) ◽  
pp. 802-805 ◽  
Author(s):  
S Arulkumaran ◽  
J Arokiaraj ◽  
N Dharmarasu ◽  
J Kumar ◽  
P Magudapathy ◽  
...  

2005 ◽  
Vol 242 (3-4) ◽  
pp. 412-418 ◽  
Author(s):  
Mehmet Şahin ◽  
Haluk Şafak ◽  
Nihat Tuğluoğlu ◽  
Serdar Karadeniz

2015 ◽  
Vol 650 ◽  
pp. 658-663 ◽  
Author(s):  
Zagarzusem Khurelbaatar ◽  
Min-Sung Kang ◽  
Kyu-Hwan Shim ◽  
Hyung-Joong Yun ◽  
Jouhan Lee ◽  
...  

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