Highly reliable planar GaInAs/InP photodiodes with high yield made by atmospheric pressure MOVPE

1988 ◽  
Vol 24 (5) ◽  
pp. 252 ◽  
Author(s):  
M.J. Robertson ◽  
S. Ritchie ◽  
S.K. Sargood ◽  
A.W. Nelson ◽  
L. Davis ◽  
...  
2020 ◽  
Vol 33 (1) ◽  
pp. 10-14
Author(s):  
RAJESH BERA

A mononuclear cobalt(II) complex, [Co(bpy)2(NO3)](NO3)·3H2O (1) (bpy = 2,2′-bipyridine) has been synthesized hydrothermally and the crystal structure was characterized by X-ray crystallography. Complex 1 is capable of activating aerobic oxygen at atmospheric pressure. [Co(bpy)2(NO3)](NO3)·3H2O (1) was used as an active catalyst for the aerobic epoxidaion of various alkenes with isobutyraldehyde as co-reductant in acetonitrile medium. Complex 1 catalyzes the epoxidaion reaction efficiently, which reflected in high yield of products with desired selectivity.


1988 ◽  
Author(s):  
M. J. Robertson ◽  
C. P. Skrimshire ◽  
S. Ritchie ◽  
S. K. Sargood ◽  
A. W. Nelson ◽  
...  

RSC Advances ◽  
2015 ◽  
Vol 5 (104) ◽  
pp. 85928-85932 ◽  
Author(s):  
Jijian Xu ◽  
Guilian Zhu ◽  
Tianquan Lin ◽  
Zhanglian Hong ◽  
Juan Wang ◽  
...  

A facile high yield molten salt route to fabricate black titania hexagonal nanosheets under atmospheric pressure and low temperature.


2010 ◽  
Vol 645-648 ◽  
pp. 857-860 ◽  
Author(s):  
Yasuhisa Sano ◽  
Takehiro Kato ◽  
Tsutomu Hori ◽  
Kazuya Yamamura ◽  
Hidekazu Mimura ◽  
...  

In order to reduce the on-resistance in vertical power transistors, backside thinning is required after device processing. However, it is difficult to thin an SiC wafer with a high yield rate by conventional mechanical machining because its high hardness and brittleness cause cracking and chipping during thinning. In this study, a small rectangular SiC sample was thinned by plasma chemical vaporization machining (PCVM), which is plasma etching using atmospheric-pressure plasma. As a result, the sample was successfully thinned to 40 m without any cracking or chipping. Furthermore, the surface roughness was improved after thinning, and the edge of the wafer became rounded automatically. Therefore, PCVM can be used as an effective method for thinning SiC wafers.


2015 ◽  
Vol 69 (4) ◽  
Author(s):  
Song-Bo Wei ◽  
Bo Tang ◽  
Xin-Hua Peng

Abstract4-Nitro-o-xylene was selectively oxidized to 2-methyl-4-nitrobenzoic acid using dilute nitric acid as the oxidizing agent under atmospheric pressure. The oxidation of 4-nitro-o-xylene was effectively promoted by an addition of radical initiators. Under reflux, 2-methyl-4-nitrobenzoic acid was afforded in high yield using nitric acid combined with N-hydroxyphthalimide, cobalt dichloride (CoCl


ACS Nano ◽  
2018 ◽  
Vol 12 (1) ◽  
pp. 884-893 ◽  
Author(s):  
Keun Su Kim ◽  
Martin Couillard ◽  
Homin Shin ◽  
Mark Plunkett ◽  
Dean Ruth ◽  
...  

2014 ◽  
Vol 962-965 ◽  
pp. 1217-1221
Author(s):  
Li Chun Zhao ◽  
Ting Liu ◽  
Di Liu

In order to solve the problem of the long production cycle and low yield of traditional inositol production process, we made several researches based on the traditional process. We experimented on the following methods to obtain a high yield qualified products: microwave-assisted phytin extraction, ion-exchange resin phytic acid absorption, elution of weak alkaline into phytate, atmospheric pressure enzymatic hydrolysis of phytate, ion exchange resin filtration, bleaching, further concentration, crystallization and refinement of hydrolysate.


Author(s):  
N. Tempel ◽  
M. C. Ledbetter

Carbon films have been a support of choice for high resolution electron microscopy since the introduction of vacuum evaporation of carbon. The desirable qualities of carbon films and methods of producing them has been extensively reviewed. It is difficult to get a high yield of grids by many of these methods, especially if virtually all of the windows must be covered with a tightly bonded, quality film of predictable thickness. We report here a method for producing carbon foils designed to maximize these attributes: 1) coverage of virtually all grid windows, 2) freedom from holes, wrinkles or folds, 3) good adhesion between film and grid, 4) uniformity of film and low noise structure, 5) predictability of film thickness, and 6) reproducibility.Our method utilizes vacuum evaporation of carbon from a fiber onto celloidin film and grid bars, adhesion of the film complex to the grid by carbon-carbon contact, and removal of the celloidin by acetone dissolution. Materials must be of high purity, and cleanliness must be rigorously maintained.


Sign in / Sign up

Export Citation Format

Share Document