Chemisorption of oxygen and subsequent processes on metal films : work function measurements

1964 ◽  
Vol 60 ◽  
pp. 899 ◽  
Author(s):  
C. M. Quinn ◽  
M. W. Roberts
Keyword(s):  
Work Function ◽  
Metal Films

Thermally-Stable High Effective Work Function TaCN and Ta2N Films for pMOS Metal Gate Applications

2008 ◽  
Vol 1073 ◽  
Author(s):  
Christoph Adelmann ◽  
P. Lehnen ◽  
L.-Å. Ragnarsson ◽  
T. Conard ◽  
A. Franquet ◽  
...  
Keyword(s):  
Work Function ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Metal Films ◽  
Organic Chemical ◽  
Thermal Budget ◽  
Effective Work ◽  
Effective Work Function ◽  
Metal Organic ◽  
Spike Annealing

ABSTRACTTaCN-based metal films were grown by metal-organic chemical-vapor deposition (MOCVD) and atomic vapor-deposition (AVD). Thermal decomposition at 500ºC leads to com-positions of approximately Ta0.50C0.4N0.1 (“TaCN”), whereas a reactive process using NH3 leads to the formation of Ta0.65C0.1N0.25 (“Ta2N”) films. All films are nearly amorphous as grown and recrystallize only weakly after spike annealing at 1050°C. The thermal stability of TaCN/HfSiO4 and Ta2N/HfSiO4 stacks during spike annealing at 1050°C was studied and Si and Hf outdiffusion into TaCN or Ta2N was observed. The effective work functions of TaCN and Ta2N on HfSiO4 were found to be as high as 4.9 eV after high thermal budget. It is demonstrated that the effective work function can be further increased to 5.1 eV after high thermal budget by the insertion of a thin Al2O3 capping layer between HfSiO4 and the metal films.

The effects of oxygen on the work function of metal films

1977 ◽  
Vol 69 (2) ◽  
pp. 708-711 ◽  
Author(s):  
Jaroslav Müller
Keyword(s):  
Work Function ◽  
Metal Films

scholarly journals The Response of Work Function οf Thin Metal Films to Interaction with Hydrogen

2008 ◽  
Vol 114 (Supplement) ◽  
pp. S-29-S-47 ◽  
Author(s):  
R. Duś ◽  
E. Nowicka ◽  
R. Nowakowski
Keyword(s):  
Work Function ◽  
Metal Films ◽  
Thin Metal ◽  
Thin Metal Films

Macromolecular structures of biological specimens are not obscured by controlled osmium impregnation

1983 ◽  
Vol 41 ◽  
pp. 606-607
Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Critical Point ◽  
Metal Films ◽  
High Magnification ◽  
Osmium Impregnation ◽  
Instrumental Resolution ◽  
20 Nm ◽  
Continuous Metal

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.

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