Effect of potential on bismuth telluride thin film growth by electrochemical atomic layer epitaxy

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pp. 4041-4047 ◽  
Author(s):  
W. Zhu ◽  
J.Y. Yang ◽  
X.H. Gao ◽  
S.Q. Bao ◽  
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...  
1994 ◽  
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Aleks Aidla ◽  
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2007 ◽  
Vol 2 (1) ◽  
pp. 102-106 ◽  
Author(s):  
Wen Zhu ◽  
Junyou Yang ◽  
Xianhui Gao ◽  
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2000 ◽  
Vol 157 (3) ◽  
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Leena-Sisko Johansson ◽  
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Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
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Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...


2011 ◽  
Vol 11 (2) ◽  
pp. 1577-1580 ◽  
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Yong Jun Park ◽  
Dong Ryeol Lee ◽  
Hyun Hwi Lee ◽  
Han-Bo-Ram Lee ◽  
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2010 ◽  
Vol 16 (47) ◽  
pp. 13925-13929 ◽  
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