scholarly journals All-Dry, One-step Synthesis, Doping and Film Formation of Conductive Polypyrrole

2021 ◽  
Author(s):  
Afshin Dianatdar ◽  
Matteo Miola ◽  
Oreste De Luca ◽  
Petra Rudolf ◽  
Francesco Picchioni ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Formation ◽  
Chemical Vapor ◽  
Polymer Synthesis ◽  
Solvent Free ◽  
Polypyrrole Films ◽  
One Step ◽  
Conductive Polypyrrole

Oxidative chemical vapor deposition (oCVD) is an extremely effective method for solvent-free deposition of highly conductive polypyrrole films, where polymer synthesis, doping, and film formation are combined in a single...

One-step growth of wafer-scale monolayer tungsten disulfide via hydrogen sulfide assisted chemical vapor deposition

2019 ◽  
Vol 115 (16) ◽  
pp. 163104 ◽  
Author(s):  
Zhiyan Jia ◽  
Jiyu Dong ◽  
Lixuan Liu ◽  
Jianyong Xiang ◽  
Anmin Nie ◽  
...  
Keyword(s):  
Hydrogen Sulfide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tungsten Disulfide ◽  
Wafer Scale ◽  
One Step ◽  
Step Growth

scholarly journals Transparent superhydrophobic PTFE films via one-step aerosol assisted chemical vapor deposition

RSC Advances ◽  
2017 ◽  
Vol 7 (47) ◽  
pp. 29275-29283 ◽  
Author(s):  
Aoyun Zhuang ◽  
Ruijin Liao ◽  
Sebastian C. Dixon ◽  
Yao Lu ◽  
Sanjayan Sathasivam ◽  
...  
Keyword(s):  
Contact Angle ◽  
Chemical Vapor Deposition ◽  
Water Contact Angle ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sliding Angle ◽  
Water Contact ◽  
Visible Transmittance ◽  
One Step

Hierarchical micro/nano-structured transparent superhydrophobic polytetrafluoroethylene films with water contact angle 168°, water sliding angle <1° and visible transmittance >90% were prepared on glass via aerosol-assisted chemical vapor deposition.

Effects of Reaction Conditions on MoS2 Thin Film Formation Synthesized by Chemical Vapor Deposition using Organic Precursor

MRS Advances ◽  
2016 ◽  
Vol 2 (29) ◽  
pp. 1533-1538 ◽  
Author(s):  
S. Ishihara ◽  
Y. Hibino ◽  
N. Sawamoto ◽  
T. Ohashi ◽  
K. Matsuura ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Flow Rate ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Film Formation ◽  
Chemical Vapor ◽  
Gas Flow Rate ◽  
Axis Orientation

ABSTRACTMolybdenum disulfide (MoS2) thin films were fabricated by two-step chemical vapor deposition (CVD) using (t-C4H9)2S2 and the effects of temperature, gas flow rate, and atmosphere on the formation were investigated in order to achieve high-speed low-temperature MoS2 film formation. From the results of X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) investigations, it was confirmed that c-axis orientation of the pre-deposited Mo film has a significant involvement in the crystal orientation after the reaction low temperature sulfurization annealing and we successfully obtained 3 nm c-axis oriented MoS2 thin film. From the S/Mo ratios in the films, it was revealed that the sulfurization reaction proceeds faster with increase in the sulfurization temperature and the gas flow rate. Moreover, the sulfurization under the H2 atmosphere promotes decomposition reaction of (t-C4H9)2S2, which were confirmed by XPS and density functional theory (DFT) simulation.

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