High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands
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We use a top-graphene layer to protect QD surface ligands during the lithography process, allowing reliable patterning of hybrid Gr/QD photodetectors via lithography and dry etching.
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2011 ◽
Vol 115
(5)
◽
pp. 1620-1626
◽
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