Photolithography-assisted precise patterning of nanocracks for ultrasensitive strain sensors
A photolithography-assisted nanocrack patterning method is reported to precisely define the nanocrack pattern in metal films. This method is used to fabricate an ultrasensitive strain sensor with a gauge factor of ∼20 000 in 0–1.2% strain range.
Keyword(s):
2021 ◽
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
2018 ◽
Vol 4
(2)
◽
pp. 1
◽
Keyword(s):