scholarly journals Investigation of Rh–titanate (ATiO3) interactions on high-surface-area perovskite thin films prepared by atomic layer deposition

2020 ◽  
Vol 8 (33) ◽  
pp. 16973-16984 ◽  
Author(s):  
Chao Lin ◽  
Alexandre C. Foucher ◽  
Yichen Ji ◽  
Eric A. Stach ◽  
Raymond J. Gorte
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Catalyst Supports ◽  
Layer Deposition

Thin, ∼1 nm films of CaTiO3, SrTiO3, and BaTiO3 were deposited onto MgAl2O4 by Atomic Layer Deposition (ALD) and studied as catalyst supports for Rh.

High-Surface Area Ceria-Zirconia Films Prepared by Atomic Layer Deposition

2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Zirconia Films

scholarly journals Atomic Layer Deposition of GdCoO3 and Gd0.9Ca0.1CoO3

Materials ◽  
2019 ◽  
Vol 13 (1) ◽  
pp. 24
Author(s):  
Marion Duparc ◽  
Henrik Hovde Sønsteby ◽  
Ola Nilsen ◽  
Anja Olafsen Sjåstad ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Films ◽  
Aspect Ratio ◽  
Atomic Layer Deposition ◽  
High Aspect Ratio ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Oxidation Catalysis ◽  
Post Annealing ◽  
Layer Deposition

Thin films of the catalytically interesting ternary and quaternary perovskites GdCoO3 and Gd0.9Ca0.1CoO3 are fabricated by atomic layer deposition using metal β-diketonates and ozone as precursors. The resulting thin films are amorphous as deposited and become single-oriented crystalline on LaAlO3(100) and YAlO3(100/010) after post-annealing at 650 °C in air. The crystal orientations of the films are tunable by choice and the orientation of the substrate, mitigated through the interface via solid face epitaxy upon annealing. The films exhibit no sign of Co2+. Additionally, high-aspect-ratio Si(100) substrates were used to document the suitability of the developed process for the preparation of coatings on more complex, high-surface-area structures. We believe that coatings of GdCoO3 and Gd1−xCaxCoO3 may find applications within oxidation catalysis.

Smart Pd Catalyst with Improved Thermal Stability Supported on High-Surface-Area LaFeO3Prepared by Atomic Layer Deposition

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Pd Catalyst ◽  
Layer Deposition

scholarly journals Toolbox for atomic layer deposition process development on high surface area powders

2021 ◽  
Vol 92 (2) ◽  
pp. 025115
Author(s):  
K. Knemeyer ◽  
R. Baumgarten ◽  
P. Ingale ◽  
R. Naumann d’Alnoncourt ◽  
M. Driess ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
Process Development ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Surface modification and functionalization of powder materials by atomic layer deposition: a review

RSC Advances ◽  
2021 ◽  
Vol 11 (20) ◽  
pp. 11918-11942
Author(s):  
Yiyun Hu ◽  
Jian Lu ◽  
Hao Feng
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Atomic Level ◽  
Powder Materials ◽  
Layer Deposition ◽  
Limiting Surface

Atomic layer deposition is a technique where gaseous precursors are used to form materials via self-limiting surface reactions. This allows conformal deposition materials on a high surface area support at the atomic level, and materials can by precisely constructed.

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