Single-particle study: effects of oxygen plasma treatment on structural and spectral changes of anisotropic gold nanorods

2020 ◽  
Vol 22 (21) ◽  
pp. 11767-11770
Author(s):  
Geun Wan Kim ◽  
Ji Won Ha
Keyword(s):  
Plasma Treatment ◽  
Gold Nanorods ◽  
Single Particle ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Oxygen Plasma Treatment ◽  
Spectral Changes ◽  
Plasma Treatment Time

Increasing the oxygen plasma treatment time gradually broadened the LSPR linewidth of the single gold nanorods.

Influence of Oxygen Plasma Treatment on Structural and Spectral Changes in Silica-coated Gold Nanorods Studied Using Total Internal Reflection Microscopy and Spectroscopy

The Analyst ◽  
2021 ◽  
Author(s):  
Jaeran Lee ◽  
Ji Won Ha
Keyword(s):  
Plasma Treatment ◽  
Gold Nanorods ◽  
Localized Surface Plasmon Resonance ◽  
Total Internal Reflection ◽  
Oxygen Plasma ◽  
Silica Shell ◽  
Localized Surface Plasmon ◽  
Oxygen Plasma Treatment ◽  
Spectral Changes ◽  
Total Internal Reflection Microscopy

This paper shows how oxygen plasma treatment affects the structural, localized surface plasmon resonance (LSPR) spectral, and spatial orientation changes in single gold nanorods coated with a mesoporous silica shell...

Effects of Oxygen-Plasma Treatment Time on the Properties of UHMWPE Fiber

2013 ◽  
Vol 781-784 ◽  
pp. 2605-2608 ◽  
Author(s):  
Wen Yu Wang ◽  
Xin Jin ◽  
Bo Wang ◽  
Li Na Bian
Keyword(s):  
Molecular Weight ◽  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Oxygen Plasma Treatment ◽  
Uhmwpe Fiber ◽  
Wetting Ability ◽  
Plasma Treatment Time ◽  
Uhmwpe Fibers ◽  
Ultra High Molecular Weight

Ultra-high-molecular-weight polyethylene (UHMWPE) fibers were treated by low temperature oxygen-plasma. The effects of oxygen-plasma treatment time on the properties of UHMWPE have been investigated. The wetting ability and roughness were increased significantly after the treatment. While, the tensile strength at break of UHMWE fibers were decreased with the treatment time. The optimum plasma treatment time is 2min.

Effect of Surface Area on the Interfacial Adhesion of UHMWPE fibers

1998 ◽  
Vol 18 (1-2) ◽  
pp. 49-62 ◽  
Author(s):  
Seung-Goo Lee ◽  
Tae-Jin Kang ◽  
Tae-Ho Yoon
Keyword(s):  
Plasma Treatment ◽  
Surface Area ◽  
Interfacial Adhesion ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Fiber Surface ◽  
Test Surface ◽  
Oxygen Plasma Treatment ◽  
Plasma Treatment Time ◽  
Uhmwpe Fibers

Abstract The surface area change of UHMWPE fibers which underwent oxygen plasma treatment was measured as a function of plasma power and plasma treatment time. The interfacial adhesion of oxygen plasma treated UHMWPE fibers was evaluated via micro-droplet test and double cantilever beam test Surface area increased with plasma treatment time at 30 and 60W, but showed a maximum at 100 and 150W. The interfacial adhesion of UHMWPE fibers to vinylester resin exhibited the same trend as the surface area. SEM analysis revealed that oxygen plasma treatment roughened UHMWPE fibers by forming micro-pores leading to increased surface area. However, 1S0W plasma treatment led to degradation of the fibers and thus resulted in failure within the fiber surface layers, producing ribbon-like strips of fiber.

Development of crystalline–amorphous parylene C structure in micro- and nano-range towards enhanced biocompatibility: the importance of oxygen plasma treatment time

RSC Advances ◽  
2015 ◽  
Vol 5 (60) ◽  
pp. 48816-48821 ◽  
Author(s):  
M. Golda-Cepa ◽  
K. Engvall ◽  
A. Kotarba
Keyword(s):  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Chemical Vapour ◽  
Oxygen Plasma Treatment ◽  
Parylene C ◽  
Plasma Treatment Time

The crystalline–amorphous parylene C structure was fabricated by Chemical Vapour Deposited (CVD) and functionalised in the micro- and nano-range with the oxygen plasma treatment.

Transition from Metallic to Semiconducting Behavior in Oxygen Plasma-treated Single-layer Graphene

2011 ◽  
Vol 1336 ◽  
Author(s):  
Amirhasan Nourbakhsh ◽  
Mirco Cantoro ◽  
Tom Vosch ◽  
Geoffrey Pourtois ◽  
Johan Hofkens ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Single Layer ◽  
Single Layer Graphene ◽  
Oxygen Plasma Treatment ◽  
Pristine Graphene ◽  
Layer Graphene ◽  
Epoxy Groups ◽  
Semiconducting Behavior

ABSTRACTWe investigate the structural, optical and electrical properties of single-layer graphene exposed to oxygen plasma treatment. We find that the pristine semimetallic behavior of graphene disappears upon plasma treatment, in favour of the opening of a bandgap and the featuring of semiconducting properties. The metal-to-semiconductor transition observed appears to be dependent on the plasma treatment time. The semiconducting behavior is also confirmed by photoluminescence measurements. The opening of a bandgap in graphene is explained in terms of graphene surface functionalization with oxygen atoms, bonded as epoxy groups. Ab initio calculations of the density of states show more details about the oxygen–graphene interaction and its effects on the graphene optoelectronic properties, predicting no states near the Fermi level at increasing epoxy group density. The structural changes are also monitored by Raman spectroscopy, showing the progressive evolution of the sp2 character of pristine graphene to sp3, due to the lattice decoration with out-of-plane epoxy groups.

Control of Threshold Voltage on the Excimer Laser Annealed Poly-Si Tfts by Oxygen Plasma Treatment on Poly-Si Surface

1995 ◽  
Vol 397 ◽  
Author(s):  
Jae-Ik Woo ◽  
Sang-Gul Lee ◽  
Dae-Gyu Moon ◽  
Chan-Hee Hong ◽  
Hoe-Sup Soh
Keyword(s):  
Plasma Treatment ◽  
Excimer Laser ◽  
Threshold Voltage ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Chemical Vapor ◽  
Gate Insulator ◽  
Oxygen Plasma Treatment ◽  
Oxide Deposition ◽  
Pressure Chemical

ABSTRACTOxygen plasma treatment was performed on the excimer laser annealed poly-Si surface, followed by gate oxide deposition with low pressure chemical vapor deposition (LPCVD) in order to control the threshold voltage of excimer laser annealed poly-Si thin film transistors (TFTs).Threshold voltages of n-channel TFTs increase from 0.4 to 2.8 V by varying the treatment time from 0 to 7 min. It is shown the effective charge density increased toward negative direction with increase of the treatment time.In addition to the increase of threshold voltage, the oxygen plasma treatment on the Si surface led to an increase in the deposition rate of LPCVD oxide films with an apparent reduction of carbon around the interface between gate insulator and poly-Si film after oxygen plasma treatment.

Influence of Oxygen Plasma Treatment on Surface Properties of Armos Fiber

2008 ◽  
Vol 373-374 ◽  
pp. 430-433 ◽  
Author(s):  
Ping Chen ◽  
Jing Wang ◽  
Cheng Shuang Zhang ◽  
Chun Lu ◽  
Zhen Feng Ding ◽  
...  
Keyword(s):  
Surface Energy ◽  
Plasma Treatment ◽  
Functional Groups ◽  
Interfacial Adhesion ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Fiber Surface ◽  
Aramid Fiber ◽  
Oxygen Plasma Treatment ◽  
Polar Functional Groups

Armos fiber (F-12 aramid fiber in paper) was provided with broad application foreground as reinforcement material for advanced composites in aviation and spaceflight field, due to its outstanding properties, such as high modulus, high strength, high temperature resistance, erosion resistance and so on. However, the exertion of property was still limited by slippery surface, low surface energy and weak interfacial adhesion performance. In this study, the effects of oxygen plasma treatment time on polar functional groups introduced onto the fiber surface, surface free energy and surface topographic images were discussed by X-ray photoelectron spectroscopy (XPS) analysis, dynamic contact angle analysis system (DCA) and atomic force microscopy (AFM), respectively. It was found that the content of oxygen element and polar functional groups on fiber surface were all increased obviously after oxygen plasma treatment. The content of oxygen element on surface for untreated F-12 aramid fiber was 11.13%, while it increased to 15.20% after oxygen plasma treatment for 10 min; The content of polar functional groups on surface for untreated F-12 aramid fiber was 28.14%, while it increased to 38.11% after oxygen plasma treatment for 10 min. The polar component (γp) of fiber surface energy increased sharply from 6.82 mN/m to 36.68 mN/m after 10 min plasma treatment, the total surface free energy was increased from 46.26 mN/m to 64.66 mN/m.The results indicated that oxygen plasma treatment had introduced a large amount of reactive functional groups onto the fiber surface, and these groups can form together as covalent bonding to improve the surface wettability and increase the surface energy of fibers. At the same time, oxygen plasma treatment was able to generate a mass of bulges and grooves on F-12 aramid fiber surface, which had an active effect on increasing the chemical bond and mechanical function between fiber and resin and enhancing the interfacial adhesion performance of composite. The fiber surface grooves had been increased with the time prolonging before 10 min while decreased after 10 min, the results maybe relate to partial organic on fiber surface melting. It had an adverse effect on the interfacial adhesion properties of composite. Therefore, the optimum plasma treatment time was between 5 min and 10 min.

scholarly journals Synergy of Oxygen Plasma and Al2O3 Atomic Layer Deposition on Improved Electrochemical Stability of Activated Carbon-Based Supercapacitor

2021 ◽  
Vol 9 ◽  
Author(s):  
Fuming Zhang ◽  
Guanghui Song ◽  
Dayakar Gandla ◽  
Yair Ein-Eli ◽  
Daniel Q. Tan
Keyword(s):  
Activated Carbon ◽  
Oxygen Plasma ◽  
Treatment Time ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Oxygen Plasma Treatment ◽  
Layer Deposition ◽  
Plasma Treatment Time ◽  
Conventional Electrode ◽  
Aluminum Oxide Layer

As a conventional electrode material of electric double-layer capacitors (EDLC), activated carbon (AC) still faces challenges to exhibit high capacitance. To address this problem, herein, we introduce a combined method of oxygen plasma and Al2O3 tomic layer deposition (ALD) on AC electrodes to reduce the impedance and improve the cycle stability of EDLC. The defect structure can be precisely designed by simply tuning the oxygen-plasma treatment time, thereby affecting the microstructures of AC electrode. Such a tactic permits the first-operated AC electrode with more defects and the ALD passivation of AC resulting in an outstanding rate performance for the device (40.6 F g–1 at 5 mA cm–2, 20.1 Fg–1 at 100 mA cm–2) and cycling stability (∼90% retention after 5,000 cycles). This benefit from the synergistic effect of defects from doped oxygen and stable aluminum oxide layer on the electrode surface. This work delivers a feasible strategy to construct a stable AC material with superior cycling performance for supercapacitor.

High Breakdown Voltage GaN HEMT Device Fabricated on Self-Standing GaN Substrate

2013 ◽  
Vol 347-350 ◽  
pp. 1535-1539
Author(s):  
Jian Jun Zhou ◽  
Liang Li ◽  
Hai Yan Lu ◽  
Ceng Kong ◽  
Yue Chan Kong ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Breakdown Voltage ◽  
Oxygen Plasma ◽  
Cutoff Frequency ◽  
Chemical Vapor ◽  
Current Gain ◽  
Organic Chemical ◽  
Oxygen Plasma Treatment ◽  
Gan Hemt ◽  
High Breakdown Voltage

In this letter, a high breakdown voltage GaN HEMT device fabricated on semi-insulating self-standing GaN substrate is presented. High quality AlGaN/GaN epilayer was grown on self-standing GaN substrate by metal organic chemical vapor deposition. A 0.8μm gate length GaN HEMT device was fabricated with oxygen plasma treatment. By using oxygen plasma treatment, gate forward working voltage is increased, and a breakdown voltage of more than 170V is demonstrated. The measured maximum drain current of the device is larger than 700 mA/mm at 4V gate bias voltage. The maximum transconductance of the device is 162 mS/mm. In addition, high frequency performance of the GaN HEMT device is also obtained. The current gain cutoff frequency and power gain cutoff frequency are 19.7 GHz and 32.8 GHz, respectively. A high fT-LG product of 15.76 GHzμm indicating that homoepitaxy technology is helpful to improve the frequency performance of the device.

FABRICATION OF TWO-DIMENSIONAL PHOTONIC CRYSTALS WITH GE2SB2TE5 NANOHOLE ARRAYS BY NANOSPHERE LITHOGRAPHY

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1300-1305
Author(s):  
KI-HO SONG ◽  
HYUN-YONG LEE ◽  
HOE-YOUNG YANG ◽  
SUNG-WON KIM ◽  
JAE-HEE SEO ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Plasma Treatment ◽  
Treatment Time ◽  
Reduction Rate ◽  
Nanosphere Lithography ◽  
Two Dimensional ◽  
Photonic Bandgaps ◽  
Nanohole Arrays ◽  
Plasma Treatment Time ◽  
Lift Off

Two-dimensional photonic crystals (2D-PCs) with Ge 2 Sb 2 Te 5 ( GST ) nanohole arrays were prepared by the nanosphere lithography (NSL) process. A primary factor of PCs is that the refractive index (n) and the n-modulation can be realized by using the GST films, which exhibit a reversible phase transformation between amorphous and crystalline states by laser illumination. The polystyrene (PS) spheres with a diameter of 500 nm were spin-coated on Si substrate and subsequently reduced by O 2-plasma treatment. The reduced spheres were utilized as a lift-off mask of the NSL process and their size and separation could be precisely controlled. Amorphous GST films were thermally evaporated and then the reduced PS spheres were removed. The fabricated GST nanohole arrays were observed by SEM and AFM. The nanohole diameters are nearly linearly reduced with increasing plasma-treatment time (t). The reduction rate (δ) for the conditions of this work was evaluated to be ~ 0.92 nm/s. The period (Λ) and filling factor (η) of PCs are structure parameters that determine their photonic bandgaps (PBGs). η-modulation can be easily achieved via a control of t and the Λ can be also modulated by the use of PS spheres with specific diameter. In addition, the PBGs for the fabricated GST 2 D PC were calculated by considering the amorphous and crystalline states of GST .

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