scholarly journals Effect of hydrogen chloride etching on carrier recombination processes of indium phosphide nanowires

Nanoscale ◽  
2019 ◽  
Vol 11 (40) ◽  
pp. 18550-18558 ◽  
Author(s):  
Xiaojun Su ◽  
Xulu Zeng ◽  
Hynek Němec ◽  
Xianshao Zou ◽  
Wei Zhang ◽  
...  

The effect of hydrogen chloride etching on charge recombination processes of indium phosphide nanowires was studied by means of time-resolved spectroscopy.

2010 ◽  
Vol 43 (32) ◽  
pp. 325502 ◽  
Author(s):  
Sumiko Tsukamoto ◽  
Andrew Murray ◽  
Christina Ankjærgaard ◽  
Mayank Jain ◽  
Torben Lapp

1989 ◽  
Vol 145 ◽  
Author(s):  
A. Werner ◽  
A. M. Agarwal ◽  
T. D. Moustakas ◽  
M. Kunst

AbstractAlxGa1-xAs films, doped with silicon in the 1 x 1018 cm-3 range, have been prepared in the composition range x = 0.20 - 0.46 by molecular beam epitaxy. The influence of defect states on excess carrier trapping and recombination processes is studied by a contactless transient photoconductivity technique in the microwave region. Effective electron life- times in the 1 x 10-5s range for the 20% Al film down to the 1 x 10-7s range for the 46% Al film were found, indicating a larger density of electron traps in more Al rich films. The decay kinetics in AlGaAs is compared with the decay kinetics in GaAs.


Nano Letters ◽  
2017 ◽  
Vol 17 (7) ◽  
pp. 4248-4254 ◽  
Author(s):  
Wei Zhang ◽  
Xulu Zeng ◽  
Xiaojun Su ◽  
Xianshao Zou ◽  
Pierre-Adrien Mante ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document