The radiation chemistry of focused electron-beam induced etching of copper in liquids

Nanoscale ◽  
2019 ◽  
Vol 11 (24) ◽  
pp. 11550-11561 ◽  
Author(s):  
Sarah K. Lami ◽  
Gabriel Smith ◽  
Eric Cao ◽  
J. Todd Hastings
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Film Thickness ◽  
Radiation Chemistry ◽  
Environmental Scanning ◽  
System P ◽  
Scanning Electron

Well-controlled, focused electron-beam induced etching of copper thin films has been successfully conducted on bulk substrates in an environmental scanning electron microscope by controlling liquid-film thickness with an in situ correlative interferometry system.

X-Ray Energy Dispersive Spectroscopy in the Environmental Scanning Electron Microscope

1998 ◽  
Vol 4 (S2) ◽  
pp. 182-183
Author(s):  
John F. Mansfield ◽  
Brett L. Pennington
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Energy Dispersive Spectroscopy ◽  
Primary Electron ◽  
Environmental Scanning ◽  
Primary Electron Beam ◽  
X Ray ◽  
Environmental Sem ◽  
Scanning Electron

The environmental scanning electron microscope (Environmental SEM) has proved to be a powerful tool in both materials science and the life sciences. Full characterization of materials in the environmental SEM often requires chemical analysis by X-ray energy dispersive spectroscopy (XEDS). However, the spatial resolution of the XEDS signal can be severely degraded by the gaseous environment in the sample chamber. At an operating pressure of 5Torr a significant fraction of the primary electron beam is scattered after it passes through the final pressure limiting aperture and before it strikes the sample. Bolon and Griffin have both published data that illustrates this effect very well. Bolon revealed that 45% of the primary electron beam was scattered by more than 25 μm in an Environmental SEM operating at an accelerating voltage of 30kV, with a water vapor pressure of 3Torr and a working distance of 15mm.

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